Patents by Inventor Marie Lowe

Marie Lowe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
    Patent number: 7291565
    Abstract: A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fluorosilicic acid.
    Type: Grant
    Filed: February 15, 2005
    Date of Patent: November 6, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Brandon Hansen, Marie Lowe
  • Selective removal chemistries for semiconductor applications, methods of production and uses thereof
    Publication number: 20060255315
    Abstract: Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.
    Type: Application
    Filed: February 10, 2006
    Publication date: November 16, 2006
    Inventors: Deborah Yellowaga, Ben Palmer, John Starzynski, John McFarland, Marie Lowe
  • Etching and cleaning BPSG material using supercritical processing
    Publication number: 20060186088
    Abstract: A method for etching and removing post-etch residue from a BPSG material is disclosed. In accordance with the method of the present invention, the BPSG material is etched and the residue is removed from the substrate structure using supercritical solutions.
    Type: Application
    Filed: February 23, 2005
    Publication date: August 24, 2006
    Inventors: Gunilla Jacobson, Robert Kevwitch, Marie Lowe
  • METHOD AND SYSTEM FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING FLUOROSILICIC ACID
    Publication number: 20060180573
    Abstract: A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fluorosilicic acid.
    Type: Application
    Filed: February 15, 2005
    Publication date: August 17, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Brandon Hansen, Marie Lowe
  • METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PREOXIDE-BASED PROCESS CHEMISTRY
    Publication number: 20060102590
    Abstract: A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry includes a peroxide-based chemistry.
    Type: Application
    Filed: February 15, 2005
    Publication date: May 18, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Robert Kevwitch, Gentaro Goshi, Joseph Hillman, Marie Lowe, Brandon Hansen
  • Method and system for treating a substrate using a supercritical fluid
    Publication number: 20060102591
    Abstract: A method and system is described for treating a substrate with a supercritical fluid using a high temperature process. For example, when the supercritical fluid includes carbon dioxide in a supercritical state, the high temperature process is performed at temperature approximately equal to and exceeding 80° C., which is greater than the critical temperature of approximately 31 ° C.
    Type: Application
    Filed: November 12, 2004
    Publication date: May 18, 2006
    Inventors: Gunilla Jacobson, Marie Lowe, Robert Kevwitch, Brandon Hansen