Patents by Inventor Marie N. Eckstein

Marie N. Eckstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Curing silicon hydride containing materials by exposure to nitrous oxide
    Patent number: 5436029
    Abstract: The present invention relates to a low temperature method of forming silica-containing ceramic coatings on substrates. The method involves applying a coating comprising a silicon hydride containing resin on a substrate and heating the coated substrate under an environment comprising nitrous oxide at a temperature sufficient to convert the resin to the silica-containing ceramic coating. This method is especially valuable for forming protective and dielectric coatings on electronic devices.
    Type: Grant
    Filed: December 21, 1992
    Date of Patent: July 25, 1995
    Assignee: Dow Corning Corporation
    Inventors: David S. Ballance, Marie N. Eckstein, Mark J. Loboda, Keith W. Michael, Liberty B. Shelton
  • Vapor phase deposition of hydrogen silsesquioxane resin in the presence of nitrous oxide
    Patent number: 5310583
    Abstract: Silicon and oxygen containing coatings are deposited by the chemical vapor deposition of hydrogen silsesquioxane in an environment comprising nitrous oxide.
    Type: Grant
    Filed: November 2, 1992
    Date of Patent: May 10, 1994
    Assignee: Dow Corning Corporation
    Inventors: Marie N. Eckstein, David S. Ballance