Abstract: The present disclosure is directed to EUV mask inspection tools including a source assembly that generates a EUV beam, a detector assembly having a projection optics system, a processor, a movable stage supporting a patterned mask, a stage control system, and a processor programmed to set the height for the stage based on instructions of a first program module that analyzes and combines mask pattern data and mask layout information to generate an out-of-plane distortion map. In an aspect, a second program module generates instructions to analyze inspection results outputted by the inspection tool to generate a defocus characterization map. In a further aspect, a present method provides predictive data and actual measured data to determine stage heights for use by a present mask inspection tool for inspection of patterned EUV masks to obtain results that compensate for defocusing to due to bowing of the patterned EUV mask.

Abstract: The present disclosure is directed to EUV mask inspection tools including a source assembly that generates a EUV beam, a detector assembly having a projection optics system, a processor, a movable stage supporting a patterned mask, a stage control system, and a processor programmed to set the height for the stage based on instructions of a first program module that analyzes and combines mask pattern data and mask layout information to generate an out-of-plane distortion map. In an aspect, a second program module generates instructions to analyze inspection results outputted by the inspection tool to generate a defocus characterization map. In a further aspect, a present method provides predictive data and actual measured data to determine stage heights for use by a present mask inspection tool for inspection of patterned EUV masks to obtain results that compensate for defocusing to due to bowing of the patterned EUV mask.