Patents by Inventor Marijn Sandtke
Marijn Sandtke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10288481Abstract: The present disclosure concerns a spectrometer (10) and method for generating a two dimensional spectrum (S). The spectrometer (10) comprises a main grating (3) and cross dispersion element (2). An imaging mirror (4) is arranged for reflecting and focussing dispersed radiation (R3) from the main grating (3) towards an image plane (IP) for imaging the two dimensional spectrum (S) onto an image plane (IP) of the spectrometer (10). A correction lens (6) is arranged for correcting optical aberrations in the imaging of the two dimensional spectrum (S) in the image plane (IP). The imaging mirror (4) and correction lens (6) have a coinciding axis of cylindrical symmetry (AS).Type: GrantFiled: December 16, 2014Date of Patent: May 14, 2019Assignee: Nederlandse Organisatie voor toegepast—natuurwetenschappelijk onderzoek TNOInventors: James Peter Robert Day, Kees Moddemeijer, Daniel Perez Calero, Tom Duivenvoorde, Marijn Sandtke
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Patent number: 10234331Abstract: The present disclosure concerns a monolithic spectrometer for spectrally resolving light. The spectrometer comprises a body of solid material having optical surfaces arranged to guide the light along an optical path inside the body. A collimating surface and focusing surface are part of a single surface having a continuous optically functional shape. The surfaces of the body are arranged to have a third or fourth part of the optical path between a grating surface and an exit surface cross with a first part of the optical path between an entry surface and a collimating surface.Type: GrantFiled: October 1, 2014Date of Patent: March 19, 2019Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Daniel Perez Calero, James Peter Robert Day, Tom Duivenvoorde, Marijn Sandtke
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Patent number: 9778195Abstract: The present disclosure concerns a method and detector (10) for detecting an analyte (1) in a sample volume (2), such as nitrosamine in an amine solvent. The method comprises measuring a resonance Raman spectrum (I1) with a first light beam (PI) matching an electronic transition of the analyte (1). The detection of the analyte is enhanced by measuring an off-resonance Raman spectrum (12) using a second light beam (P2) that is shifted in wavelength at least 10 nm away from the electronic resonance. The resonance Raman signal (S1) of the analyte (1) is isolated from the background (Q1, Q2) by a difference analysis between the resonance and off-resonance Raman spectra (I1, I2). The method and detector (10) can be employed for detecting nitrosamine in a carbon capture process or plant (20) that employs an amine solvent.Type: GrantFiled: May 23, 2014Date of Patent: October 3, 2017Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: James Peter Robert Day, Marijn Sandtke
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Publication number: 20170016767Abstract: The present disclosure concerns a spectrometer (10) and method for generating a two dimensional spectrum (S). The spectrometer (10) comprises a main grating (3) and cross dispersion element (2). An imaging mirror (4) is arranged for reflecting and focussing dispersed radiation (R3) from the main grating (3) towards an image plane (IP) for imaging the two dimensional spectrum (S) onto an image plane (IP) of the spectrometer (10). A correction lens (6) is arranged for correcting optical aberrations in the imaging of the two dimensional spectrum (S) in the image plane (IP). The imaging mirror (4) and correction lens (6) have a coinciding axis of cylindrical symmetry (AS).Type: ApplicationFiled: December 16, 2014Publication date: January 19, 2017Inventors: James Peter Robert DAY, Kees MODDEMEIJER, Daniel PEREZ CALERO, Tom DUIVENVOORDE, Marijn SANDTKE
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Publication number: 20160245693Abstract: The present disclosure concerns a monolithic spectrometer (1) for spectrally resolving light (R). The spectrometer (1) comprises a body (2) of solid material having optical surfaces (3, 4, 5, 6, 8) arranged to guide the light (R) along an optical path (E1, E2, E3, E4) inside the body (2). A collimating surface (4) and focusing surface (6) are part of a single surface having a continuous optically functional shape. The surfaces (3,4,5,6,8) of the body (2) are arranged to have a third or fourth part (E3, E4) of the optical path between a grating surface (5) and an exit surface (8) cross (C) with a first part (E1) of the optical path between an entry surface (3) and a collimating surface (4).Type: ApplicationFiled: October 1, 2014Publication date: August 25, 2016Inventors: Daniel Perez Calero, James Peter Robert Day, Tom Duivenvoorde, Marijn Sandtke
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Publication number: 20160116414Abstract: The present disclosure concerns a method and detector (10) for detecting an analyte (1) in a sample volume (2), such as nitrosamine in an amine solvent. The method comprises measuring a resonance Raman spectrum (I1) with a first light beam (P1) matching an electronic transition of the analyte (1). The detection of the analyte is enhanced by measuring an off-resonance Raman spectrum (I2) using a second light beam (P2) that is shifted in wavelength at least 10 nm away from the electronic resonance. The resonance Raman signal (S1) of the analyte (1) is isolated from the background (Q1, Q2) by a difference analysis between the resonance and off-resonance Raman spectra (I1, I2). The method and detector (10) can be employed for detecting nitrosamine in a carbon capture process or plant (20) that employs an amine solvent.Type: ApplicationFiled: May 23, 2014Publication date: April 28, 2016Inventors: James Peter Robert DAY, Marijn SANDTKE
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Publication number: 20130229651Abstract: The optical probe contains a monolithic body of optically transparent material to perform focusing for a plurality of parallel light paths from one or more fibers to one or more object points. Surface parts of the monolithic body are curved to form lenses and/or coated with a reflective coating. On a fiber side of the monolithic body an opening or openings are provided in a reflective coating opposite the tip or tips of the fibers to pass light. On the object side of the monolithic body, a coated surface part reflects the light path from the openings back to the fiber side of the monolithic body, from where the light path is reflected towards an aperture on the object side. At least part of the reflecting surfaces is curved to form reflector a plurality of distinct lenses on the same side of the monolithic body.Type: ApplicationFiled: September 20, 2011Publication date: September 5, 2013Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNOInventors: Bastiaan Robert Ouwerkerk, Kees Moddemeijer, Marijn Sandtke
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Patent number: 8477285Abstract: An optical assembly is mounted in a projection exposure apparatus (101) for EUV microlithography and includes at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) arranged to be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) configured to clean the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (po) for performing an exposure operation with the projection exposure apparatus (101). As a result, optical elements having respective optical surfaces arranged to be impinged upon by a useful beam bundle can be cleaned reliably of foreign particles.Type: GrantFiled: December 20, 2010Date of Patent: July 2, 2013Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Dirk Heinrich Ehm, Arnoldus Jan Storm, Johannes Hubertus Josephina Moors, Almut Czap, Mona Nagel, Jacques Cor Johan van der Donck, Jetske Karina Stortelder, Marijn Sandtke, Maria Isabel Catalina Caballero, Luigi Scaccabarozzi
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Publication number: 20110188011Abstract: An optical assembly is mounted in a projection exposure apparatus (101) for EUV microlithography and includes at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) arranged to be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) configured to clean the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (po) for performing an exposure operation with the projection exposure apparatus (101). As a result, optical elements having respective optical surfaces arranged to be impinged upon by a useful beam bundle can be cleaned reliably of foreign particles.Type: ApplicationFiled: December 20, 2010Publication date: August 4, 2011Applicants: Carl Zeiss SMT GmbH, ASML NETHERLANDS B.V.Inventors: Dirk Heinrich EHM, Arnoldus Jan Storm, Johannes Hubertus Josephina Moors, Almut Czap, Mona Nagel, Jacques Cor Johan van der Donck, Jetske Karina Stortelder, Marijn Sandtke, Maria Isabel Catalina Caballero, Luigi Scaccabarozzi