Patents by Inventor Mariko Kimura

Mariko Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11975326
    Abstract: A cell accommodating chip capable of accommodating a plurality of cells includes a substrate composed of a light-transmitting material, and a plurality of wells on at least one of main faces of the substrate, the plurality of wells being capable of accommodating cells. A surface of the cell accommodating chip including the plurality of wells has a low cell adhesion property, and affinity to a specific binding material having affinity to a produced substance produced by a cell accommodated in one of the wells and/or a released substance released by the cell.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: May 7, 2024
    Assignee: YAMATO SCIENTIFIC CO., LTD.
    Inventors: Mariko Matsunaga, Ken Tsukii, Kenichi Kimura, Toru Takahashi, Jie Xu
  • Publication number: 20240018007
    Abstract: An object of the present invention is to provide a metal-doped porous silica that can be blended into an article, for example, a cosmetic product such as a perm treatment agent, and kept stably dispersed therein. The metal-doped porous silica of the present invention as a means for resolution is surface-modified with a vinylpyrrolidone unit-containing polymer. As specific examples of vinylpyrrolidone unit-containing polymers, a copolymer of vinylpyrrolidone and dimethylaminoethyl methacrylate, polyvinylpyrrolidone, and the like can be mentioned.
    Type: Application
    Filed: December 8, 2021
    Publication date: January 18, 2024
    Applicant: Toyo Seikan Group Holdings, Ltd.
    Inventors: Kazuaki OHASHI, Mariko KIMURA, Daisuke IKUTAME
  • Publication number: 20230052768
    Abstract: A porous silica having at least one metal X selected from the group consisting of Mn, Cu and Fe.
    Type: Application
    Filed: January 17, 2020
    Publication date: February 16, 2023
    Applicant: Toyo Seikan Group Holdings, Ltd.
    Inventors: Mariko KIMURA, Kazuaki OHASHI, Daisuke IKUTAME
  • Patent number: 11090403
    Abstract: To provide a porous silica which is capable of effectively eliminating odors of methyl mercaptan, hydrogen sulfide, nonenal and the like, said odors being difficult to be eliminated by a silica porous material that contains no metal. A porous silica containing particles that are provided with primary pores, wherein the particles contain a metal containing substance complex having a particle size of 1-100 nm. This porous silica has a specific surface area of 500 m2/g or more.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: August 17, 2021
    Assignee: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Kazuaki Ohashi, Mariko Kimura
  • Publication number: 20190001014
    Abstract: To provide a porous silica which is capable of effectively eliminating odors of methyl mercaptan, hydrogen sulfide, nonenal and the like, said odors being difficult to be eliminated by a silica porous material that contains no metal. A porous silica containing particles that are provided with primary pores, wherein the particles contain a metal containing substance complex having a particle size of 1-100 nm. This porous silica has a specific surface area of 500 m2/g or more.
    Type: Application
    Filed: July 15, 2016
    Publication date: January 3, 2019
    Inventors: Kazuaki Ohashi, Mariko Kimura
  • Patent number: 9185806
    Abstract: A printed wiring board includes an interlayer resin insulation layer, a pad structure formed on the interlayer resin insulation layer and positioned to mount a semiconductor device, and a solder-resist layer formed on the interlayer resin insulation layer and having an opening portion exposing a portion of the pad structure from the solder-resist layer. The opening portion of the solder-resist layer has a bottom surface such that the bottom surface of the opening portion is exposing an upper surface and a portion of a side surface of the pad structure.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: November 10, 2015
    Assignee: IBIDEN CO., LTD.
    Inventors: Fumitaka Takagi, Nobuhisa Kuroda, Mariko Kimura
  • Publication number: 20140090877
    Abstract: A printed wiring board includes an interlayer resin insulation layer, a pad structure formed on the interlayer resin insulation layer and positioned to mount a semiconductor device, and a solder-resist layer formed on the interlayer resin insulation layer and having an opening portion exposing a portion of the pad structure from the solder-resist layer. The opening portion of the solder-resist layer has a bottom surface such that the bottom surface of the opening portion is exposing an upper surface and a portion of a side surface of the pad structure.
    Type: Application
    Filed: September 30, 2013
    Publication date: April 3, 2014
    Applicant: IBIDEN CO., LTD.
    Inventors: Fumitaka TAKAGI, Nobuhisa Kuroda, Mariko Kimura
  • Patent number: 6783636
    Abstract: A polycrystalline thin film of MgO is formed on a substrate by an ion sputtering process wherein the thin film is obtained by irradiating a target with an ion beam to dislodge particles from the target and deposit the particles on the substrate. The film is preferably formed in an atmosphere at a reduced pressure of 3.0×10−2 Pa or lower while keeping the substrate temperature at 300° C. or lower.
    Type: Grant
    Filed: October 6, 2001
    Date of Patent: August 31, 2004
    Assignee: Fujikura Ltd.
    Inventors: Yasuhiro Iijima, Mariko Kimura, Takashi Saito
  • Patent number: 6716796
    Abstract: A polycrystalline thin film B consisting mainly of oxide crystal grains 20 which have a crystal structure of a Type C rare earth oxide represented by one of the formulas Y2O3, Sc2O3, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb2O3, Dy2O3, Ho2O3, Er2O3, Yb2O3, Lu2O3, and Pm2O3 formed on a film forming surface of a polycrystalline substrate A wherein grain boundary inclination angles between the corresponding crystal axes of different crystal grains in the polycrystalline thin film along a plane parallel to the film forming surface of the polycrystalline substrate are controlled within 30 degrees.
    Type: Grant
    Filed: June 11, 2001
    Date of Patent: April 6, 2004
    Assignees: Fujikura Ltd, International Superconductivity, Technology Center, The Juridical Foundation
    Inventors: Yasuhiro Iijima, Mariko Kimura, Takashi Saito
  • Patent number: 6632539
    Abstract: The polycrystalline thin film is made of a composite oxide of a cubic crystal system which has a pyrochlore type crystalline structure of a composition represented as either AZrO or AHfO (A in the formula represents a rare earth element selected from among Y, Yb, Tm, Er, Ho, Dy, Eu, Gd, Sm, Nd, Pr, Ce and La) formed on the film forming surface of the polycrystalline substrate, wherein the grain boundary misalignment angle between the same crystal axes of different crystal grains in the polycrystalline thin film along a plane parallel to the film forming surface of the polycrystalline substrate are controlled within 30°.
    Type: Grant
    Filed: July 25, 2001
    Date of Patent: October 14, 2003
    Assignees: Fujikura Ltd., International Superconductivity Technology Center,
    Inventors: Yasuhiro Iijima, Mariko Kimura, Takashi Saitoh
  • Publication number: 20020157601
    Abstract: A polycrystalline thin film of MgO is formed on a substrate by an ion sputtering process wherein the thin film is obtained by irradiating a target with an ion beam to dislodge particles from the target and deposit the particles on the substrate. The film is preferably formed in an atmosphere at a reduced pressure of 3.0×10−2 Pa or lower while keeping the substrate temperature at 300° C. or lower.
    Type: Application
    Filed: October 6, 2001
    Publication date: October 31, 2002
    Inventors: Yasuhiro Iijima, Mariko Kimura, Takashi Saito
  • Patent number: 5814220
    Abstract: A process for the production of a blood separating agent is disclosed which comprises supplying a mixture solution containing (a) a separation layer forming high molecular weight compound as the main component and (b) a thixotropy-providing agent selected from the group consisting of inorganic fine particles and organic gelling agents into a cylinder block of a homogenizer having the cylinder block equipped with a plunger capable of performing reciprocating movement and a valve body which is connected thereto and equipped with a valve member, a valve sheet and an impact ring, and applying a compressive shearing stress to the mixture in said homogenizer at such a temperature that viscosity of the solution becomes 1.times.10.sup.4 centipoises or less, thereby obtaining a blood separating agent in the form of a dispersion or a uniform gel. A blood separating agent having excellent storage stability can be obtained with improved productivity per unit time.
    Type: Grant
    Filed: December 11, 1996
    Date of Patent: September 29, 1998
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hiroshi Mikami, Kenshin Nakahara, Mariko Kimura, Toshikazu Ishii
  • Patent number: 5317510
    Abstract: A method and an apparatus for generating sentences capable of generating more natural and easily comprehensible sentences by incorporating the selection of an appropriate choice for the form of expression or the order of words from a number of possible candidates in a process of sentence construction. In the apparatus, conceptual structures to be utilized as elements of sentences to be generated are stored; rules to be followed in generating sentences are stored; and sentences are generated from the stored conceptual structures in accordance with the stored rules by utilizing sizes of partial structures of the conceptual structures specified by the stored rules to determine a sentence structure of the sentence to be generated.
    Type: Grant
    Filed: March 16, 1992
    Date of Patent: May 31, 1994
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yumiko Yoshimura, Hideki Hirakawa, Yoshimi Asahioka, Mariko Kimura