Patents by Inventor Mariko Shimamura

Mariko Shimamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040166443
    Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form the phosphor pattern. Also provided are this process for forming the phosphor pattern, a photosensitive element for a FED and a FED display panel.
    Type: Application
    Filed: February 25, 2004
    Publication date: August 26, 2004
    Inventors: Seiji Tai, Yoshiyuki Horibe, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Naoki Kimura, Mariko Shimamura
  • Publication number: 20020142237
    Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form the phosphor pattern. Also provided are this process for forming the phosphor pattern, a photosensitive element for a FED and a FED display panel.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 3, 2002
    Inventors: Seiji Tai, Yoshiyuki Horibe, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Naoki Kimura, Mariko Shimamura
  • Patent number: 6391504
    Abstract: A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process whichh comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor, for forming a pattern; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development, to form the pattern; and (IV) calcining the pattern to remove an unnecessary portion, to form the phosphor pattern. Also provided ar this process for forming the phosphor pattern, a photosensitive element for a FED and a field emission display panel.
    Type: Grant
    Filed: May 22, 1998
    Date of Patent: May 21, 2002
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Seiji Tai, Yoshiyuki Horibe, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Naoki Kimura, Mariko Shimamura
  • Publication number: 20020037478
    Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing
    Type: Application
    Filed: September 20, 2001
    Publication date: March 28, 2002
    Inventors: Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Yoshiyuki Horibe, Mariko Shimamura, Toranosuke Ashizawa, Eiji Fujita, Seikichi Tanno
  • Patent number: 6358663
    Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing (A) an organic material containing at least one selected from the group consisting of an alkali metal and an alkaline earth metal; and (B) a phosphor wherein an amount of the alkali metal or the alkaline earth metal is 2% by weight or less based on the amount of (B) the phosphor, a process for preparing the same, an organic alkali developing solution for forming the same, an emulsion developing solution for forming the same and a back plate for plasma display using the same.
    Type: Grant
    Filed: January 8, 2001
    Date of Patent: March 19, 2002
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Yoshiyuki Horibe, Mariko Shimamura, Toranosuke Ashizawa, Eiji Fujita, Seikichi Tanno
  • Publication number: 20010002302
    Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing
    Type: Application
    Filed: January 8, 2001
    Publication date: May 31, 2001
    Inventors: Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Yoshiyuki Horibe, Mariko Shimamura, Toranosuke Ashizawa, Eiji Fujita, Seikichi Tanno
  • Publication number: 20010001696
    Abstract: Disclosed are a process for preparing a phosphor pattern for a field emission display panel which comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) irradiating active light to (A) the photosensitive resin composition layer containing a phosphor imagewisely; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been imagewisely irradiated by development to form a pattern; and (IV) calcining the pattern to remove unnecessary portion to form a phosphor pattern, a photosensitive element for a FED display panel, phosphor pattern for a FED display panel, and a FED display panel.
    Type: Application
    Filed: May 22, 1998
    Publication date: May 24, 2001
    Inventors: SEIJI TAI, YOSHIYUKI HORIBE, HIROYUKI TANAKA, TAKESHI NOJIRI, KAZUYA SATOU, NAOKI KIMURA, MARIKO SHIMAMURA
  • Patent number: 6232024
    Abstract: Disclosed are a phosphor pattern which comprises a calcination product of a phosphor pattern precursor containing (A) an organic material containing at least one selected from the group consisting of an alkali metal and an alkaline earth metal; and (B) a phosphor wherein an amount of the alkali metal or the alkaline earth metal is 2% by weight or less based on the amount of (B) the phosphor, a process for preparing the same, an organic alkali developing solution for forming the same, an emulsion developing solution for forming the same and a back plate for plasma display using the same.
    Type: Grant
    Filed: April 14, 1998
    Date of Patent: May 15, 2001
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Naoki Kimura, Seiji Tai, Hiroyuki Tanaka, Takeshi Nojiri, Kazuya Satou, Yoshiyuki Horibe, Mariko Shimamura, Toranosuke Ashizawa, Eiji Fujita, Seikichi Tanno
  • Patent number: 5134156
    Abstract: Actinonin or a salt thereof is active as an inhibitor of angiogenesis in a mammal and is useful as a therapeutic agent for inhibiting angiogenesis in a mammal having diabetic retinopathy or inflammatory response accompanied by angiogenesis.
    Type: Grant
    Filed: September 19, 1990
    Date of Patent: July 28, 1992
    Assignee: Zaidan Hojin Biseibutsu Kagaku Kai
    Inventors: Takao Iwaguchi, Mariko Shimamura, Shingo Uchida, Takaaki Aoyagi, Tomio Takeuchi