Patents by Inventor Mariko Yoshida
Mariko Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140099504Abstract: A pressure-sensitive adhesive film, including a substrate and a pressure-sensitive adhesive layer provided on at least one side of the substrate, wherein the pressure-sensitive adhesive layer contains a (meth)acryl-based polymer, an alkali metal salt, and a crosslinking agent, and the pressure-sensitive adhesive layer contains 2 parts by weight or less of the crosslinking agent based on 100 parts by weight of the (meth)acryl-based polymer, the pressure-sensitive adhesive film having an adhesive strength of 0.5 N/25 mm or more as measured at a tension rate of 0.3 m/minute after it is placed on an adherend of an acrylic panel under conditions of 23° C. and 50% RH for 30 minutes, and uses for the film.Type: ApplicationFiled: May 11, 2012Publication date: April 10, 2014Applicant: NITTO DENKO CORPORATIONInventors: Mariko Yoshida, Natsuki Ukei, Ikkou Hanaki
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Publication number: 20140004343Abstract: Provided is a surface protective sheet, which satisfactorily adheres to an adherend and which shows little increase in adhesion with time, can easily be re-released, reduces the amount of a pressure-sensitive adhesive remaining on the surface of the adherend after the release of the sheet, and does not impair the self-cleaning property of the surface of a coated plate as the adherend. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which, when the surface protective sheet is attached to a silicon wafer on the pressure-sensitive adhesive layer side of the sheet and left to stand at 40° C. for 24 hours, and then the surface protective sheet is released under a temperature environment of 23° C., the surface of the resultant silicon wafer has a C/Si ratio of 0.8 or less in photoelectron spectroscopy analysis.Type: ApplicationFiled: August 29, 2013Publication date: January 2, 2014Applicant: NITTO DENKO CORPORATIONInventors: Jiro YAMATO, Keiji HAYASHI, Ryohei SAWAZAKI, Mariko YOSHIDA
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Publication number: 20130344288Abstract: Provided is a surface protective sheet which satisfactorily adheres even to a coated surface having a rough surface, and not only does not cause an adhesive residue that can be observed with eyes but also does not impair the self-cleaning property of the surface of a coated plate. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which: the pressure-sensitive adhesive layer has an adhesion for a coated steel plate having a ten-point average surface roughness Rz of 8.0 ?m of 0.05 N/20 mm or more; a main component in a pressure-sensitive adhesive for constructing the pressure-sensitive adhesive layer includes a polymer P obtained by cross-linking a polymer A; the polymer A has a weight-average molecular weight Mw of 500,000 or more; the polymer A has a distribution degree Mw/Mn of 8.0 or less; and an insoluble content of the polymer P in ethyl acetate is 90 wt % or more.Type: ApplicationFiled: August 29, 2013Publication date: December 26, 2013Applicant: NITTO DENKO CORPORATIONInventors: Keiji HAYASHI, Jiro YAMATO, Ryohei SAWAZAKI, Mariko YOSHIDA
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Publication number: 20130344328Abstract: Provided is a surface protective sheet, which satisfactorily adheres to an adherend and which can be easily re-released and suppresses contamination due to a pressure-sensitive adhesive remaining on the surface of the adherend after the release of the sheet. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which a difference ?T (%) between the visible light transmittance T1 (%) of a transparent substrate having an antireflection film and the visible light transmittance T2 (%) of the transparent substrate resulting when the surface protective sheet is attached to one side of the transparent substrate and left to stand at 160° C. for 1 hour, and then the surface protective sheet is released under a temperature environment of 23° C. (?T=T1?T2) satisfies a relationship of ?T?1.8.Type: ApplicationFiled: August 29, 2013Publication date: December 26, 2013Applicant: NITTO DENKO CORPORATIONInventors: Ryohei SAWAZAKI, Keiji HAYASHI, Jiro YAMATO, Mariko YOSHIDA, Mitsushi YAMAMOTO, Kenta YAMASHITA
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Publication number: 20130344327Abstract: Provided is a surface protective sheet which satisfactorily adheres even to a coated surface having a rough surface, and not only does not cause an adhesive residue that can be observed with eyes but also does not impair the self-cleaning property of the surface of a coated plate. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which: a main component in a pressure-sensitive adhesive for constructing the pressure-sensitive adhesive layer includes a polymer P obtained by cross-linking a polymer A; in pulse NMR measurement of the polymer P at 30° C., the maximum spin-spin relaxation time T2MAX in all spin-spin relaxation times T2 of protons to be measured falls within the range of 300 to 800 ?s; and the content of a polymer component corresponding to the maximum spin-spin relaxation time T2MAX in the polymer P is 60% or more.Type: ApplicationFiled: August 29, 2013Publication date: December 26, 2013Applicant: NITTO DENKO CORPORATIONInventors: Mariko YOSHIDA, Jiro YAMATO, Ryohei SAWAZAKI, Keiji HAYASHI
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Patent number: 8521844Abstract: Disclosed herein is an information processing apparatus configured to distribute stored content to a client reproducing apparatus connected to the information processing apparatus via a network, which may include acquiring means; real item information generating means; extracting means; virtual item generating means; reproduction sequence list generating means; virtual item information generating means; collecting means; and distributing means.Type: GrantFiled: January 6, 2010Date of Patent: August 27, 2013Assignee: Sony CorporationInventors: Mariko Yoshida, Toshiaki Kusakabe, Satoshi Hiroi, Masahiro Hara
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Publication number: 20120177880Abstract: Provided is a surface protective sheet which satisfactorily adheres even to a coated surface having a rough surface and does not impair the self-cleaning property of the surface of a coated plate even after a long period of attachment thereto. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which: when the surface protective sheet is attached to an adherend and left to stand at 50° C. for 24 hours, and then the surface protective sheet is peeled under a temperature environment of 23° C., a surface of the resultant adherend has a water contact angle of 70° or less; and when the surface protective sheet is attached to an adherend and left to stand at 50° C. for 14 days, and then the surface protective sheet is peeled under a temperature environment of 23° C., a surface of the resultant adherend has a water contact angle of 70° or less.Type: ApplicationFiled: December 29, 2011Publication date: July 12, 2012Applicant: NITTO DENKO CORPORATIONInventors: Jiro YAMATO, Keiji HAYASHI, Ryohei SAWAZAKI, Mariko YOSHIDA
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Publication number: 20120135229Abstract: Provided is a surface protective sheet, which satisfactorily adheres to an adherend and which can be easily re-released and suppresses contamination due to a pressure-sensitive adhesive remaining on the surface of the adherend after the release of the sheet. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which a difference ?T (%) between the visible light transmittance T1(%) of a transparent substrate having an antireflection film and the visible light transmittance T2(%) of the transparent substrate resulting when the surface protective sheet is attached to one side of the transparent substrate and left to stand at 160° C. for 1 hour, and then the surface protective sheet is released under a temperature environment of 23° C. (?T=T1?T2) satisfies a relationship of ?T?1.8.Type: ApplicationFiled: November 28, 2011Publication date: May 31, 2012Applicant: NITTO DENKO CORPORATIONInventors: Ryohei SAWAZAKI, Keiji HAYASHI, Jiro YAMATO, Mariko YOSHIDA, Mitsushi YAMAMOTO, Kenta YAMASHITA
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Publication number: 20120135230Abstract: A surface protective sheet which satisfactorily adheres to coated rough surfaces, with no observable adhesive residue without impairing the self-cleaning property of a coated plate, including a base material layer; and a pressure-sensitive adhesive layer, wherein: the pressure-sensitive adhesive layer has an adhesion for a coated steel plate having a ten-point average surface roughness Rz of 8.0 ?m of 0.05 N/20 mm or more; a main component including a polymer P obtained by cross-linking a polymer A; the polymer A having a weight-average molecular weight Mw of 500,000 or more; the polymer A having a distribution degree Mw/Mn of 8.0 or less; and an insoluble content of the polymer P in ethyl acetate is 90 wt % or more.Type: ApplicationFiled: November 28, 2011Publication date: May 31, 2012Applicant: NITTO DENKO CORPORATIONInventors: Keiji HAYASHI, Jiro YAMATO, Ryohei SAWAZAKI, Mariko YOSHIDA
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Publication number: 20120135231Abstract: Provided is a surface protective sheet which satisfactorily adheres even to a coated surface having a rough surface, and not only does not cause an adhesive residue that can be observed with eyes but also does not impair the self-cleaning property of the surface of a coated plate. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which: a main component in a pressure-sensitive adhesive for constructing the pressure-sensitive adhesive layer includes a polymer P obtained by cross-linking a polymer A; in pulse NMR measurement of the polymer P at 30° C., the maximum spin-spin relaxation time T2MAX in all spin-spin relaxation times T2 of protons to be measured falls within the range of 300 to 800 ?s; and the content of a polymer component corresponding to the maximum spin-spin relaxation time T2MAX in the polymer P is 60% or more.Type: ApplicationFiled: November 28, 2011Publication date: May 31, 2012Applicant: NITTO DENKO CORPORATIONInventors: Mariko YOSHIDA, Jiro YAMATO, Ryohei SAWAZAKI, Keiji HAYASHI
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Publication number: 20120135232Abstract: Provided is a surface protective sheet, which satisfactorily adheres to an adherend and which shows little increase in adhesion with time, can easily be re-released, reduces the amount of a pressure-sensitive adhesive remaining on the surface of the adherend after the release of the sheet, and does not impair the self-cleaning property of the surface of a coated plate as the adherend. The surface protective sheet includes: a base material layer; and a pressure-sensitive adhesive layer, in which, when the surface protective sheet is attached to a silicon wafer on the pressure-sensitive adhesive layer side of the sheet and left to stand at 40° C. for 24 hours, and then the surface protective sheet is released under a temperature environment of 23° C., the surface of the resultant silicon wafer has a C/Si ratio of 0.8 or less in photoelectron spectroscopy analysis.Type: ApplicationFiled: November 28, 2011Publication date: May 31, 2012Applicant: NITTO DENKO CORPORATIONInventors: Jiro YAMATO, Keiji HAYASHI, Ryohei SAWAZAKI, Mariko YOSHIDA
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Publication number: 20110281067Abstract: Provided is a surface protective film that not only maintains its adhesion for an adherend but also shows a small change over time in rewinding force even when stored in a roll shape. The surface protective film of the present invention includes: a back surface layer; a base material layer; and a pressure-sensitive adhesive layer in the stated order, in which: the surface of the back surface layer has a ten-point average surface roughness Rz of 1.0 or more; a rewinding force A after storage at 23° C. is 1.0 N/20 mm or less; and a ratio B/A of a rewinding force B after storage at 50° C. to the rewinding force A after the storage at 23° C. is 1.0 to 2.0.Type: ApplicationFiled: May 10, 2011Publication date: November 17, 2011Applicant: NITTO DENKO CORPORATIONInventors: Mariko YOSHIDA, Shou UCHIDA, Ikkou HANAKI, Keiji HAYASHI
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Publication number: 20100115062Abstract: Disclosed herein is an information processing apparatus configured to distribute stored content to a client reproducing apparatus connected to the information processing apparatus via a network, which may include acquiring means; real item information generating means; extracting means; virtual item generating means; reproduction sequence list generating means; virtual item information generating means; collecting means; and distributing means.Type: ApplicationFiled: January 6, 2010Publication date: May 6, 2010Applicant: Sony CorporationInventors: Mariko Yoshida, Toshiaki Kusakabe, Satoshi Hiroi, Masahiro Hara
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Patent number: 7668933Abstract: Disclosed herein is an information processing apparatus configured to distribute stored content to a client reproducing apparatus connected to the information processing apparatus via a network, which may include acquiring means; real item information generating means; extracting means; virtual item generating means; reproduction sequence list generating means; virtual item information generating means; collecting means; and distributing means.Type: GrantFiled: October 30, 2007Date of Patent: February 23, 2010Assignee: Sony CorporationInventors: Mariko Yoshida, Toshiaki Kusakabe, Satoshi Hiroi, Masahiro Hara
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Publication number: 20080208952Abstract: Disclosed herein is an information processing apparatus configured to distribute stored content to a client reproducing apparatus connected to the information processing apparatus via a network, which may include acquiring means; real item information generating means; extracting means; virtual item generating means; reproduction sequence list generating means; virtual item information generating means; collecting means; and distributing means.Type: ApplicationFiled: October 30, 2007Publication date: August 28, 2008Applicant: Sony CorporationInventors: Mariko Yoshida, Toshiaki Kusakabe, Satoshi Hiroi, Masahiro Hara