Patents by Inventor Marilena Radoiu

Marilena Radoiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10103006
    Abstract: An elementary device of the present disclosure includes a coaxial applicator that includes a connector disposed at a distal end of the applicator, a shielding, a microwave energy propagation medium disposed between a central core and the shielding, and an insulating body disposed at a proximal end of the applicator. The shielding surrounds the central core and has a bottom wall provided at the distal end. The connector includes an external conductor connected to the shielding and an internal conductor connected to the central core. The connector is disposed at the bottom wall with the external conductor fixed to the bottom wall and the internal conductor linked to a connecting element that extends through the bottom wall and parallel to the main axis with a predefined spacing provided between the central core and a free end connected to the central core at a predefined distance from the bottom wall.
    Type: Grant
    Filed: April 5, 2018
    Date of Patent: October 16, 2018
    Assignee: SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQUE ET MICRO ONDES
    Inventors: Louis Latrasse, Marilena Radoiu
  • Publication number: 20180261433
    Abstract: The present disclosure relates to an elementary device for producing a plasma. The elementary device includes a coaxial applicator of microwave power that includes a conductive central core, a conductive external shield surrounding the central core, a medium located between the central core and the shield to propagate microwave energy, and an insulating body. The elementary device further includes a system to couple to a microwave generator and is disposed at the shield. The shield has a proximal end plugged with the insulating body made of dielectric material that is transparent to the microwave energy. The insulating body has an external surface configured to contact and excite a gas located in the interior of a chamber. The insulating body extends exterior wise from the shield and its external surface is nonplanar and protrudes from the shield. The outside diameter of the body decreases from the shield to its tip.
    Type: Application
    Filed: April 5, 2018
    Publication date: September 13, 2018
    Applicant: SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQUE ET MICRO ONDES
    Inventors: Louis LATRASSE, Marilena RADOIU
  • Publication number: 20180233332
    Abstract: An elementary device of the present disclosure includes a coaxial applicator that includes a connector disposed at a distal end of the applicator, a shielding, a microwave energy propagation medium disposed between a central core and the shielding, and an insulating body disposed at a proximal end of the applicator. The shielding surrounds the central core and has a bottom wall provided at the distal end. The connector includes an external conductor connected to the shielding and an internal conductor connected to the central core. The connector is disposed at the bottom wall with the external conductor fixed to the bottom wall and the internal conductor linked to a connecting element that extends through the bottom wall and parallel to the main axis with a predefined spacing provided between the central core and a free end connected to the central core at a predefined distance from the bottom wall.
    Type: Application
    Filed: April 5, 2018
    Publication date: August 16, 2018
    Applicant: SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQUE ET MICRO ONDES
    Inventors: Louis LATRASSE, Marilena RADOIU
  • Patent number: 9860941
    Abstract: The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected PR(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power PR(i) and/or to adjust the transmitted power PT(i).
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: January 2, 2018
    Assignee: SAIREM SOCIETE POUR L'APPLICATION
    Inventors: Adrien Grandemenge, Jean-Marie Jacomino, Marilena Radoiu, Louis Latrasse
  • Patent number: 9333460
    Abstract: A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapor.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: May 10, 2016
    Assignee: Edwards Limited
    Inventor: Marilena Radoiu
  • Patent number: 9044707
    Abstract: In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: June 2, 2015
    Assignee: Edwards Limited
    Inventors: Marilena Radoiu, James Robert Smith, Andrew James Seeley
  • Publication number: 20140197761
    Abstract: The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected PR(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power PR(i) and/or to adjust the transmitted power PT(i).
    Type: Application
    Filed: April 25, 2012
    Publication date: July 17, 2014
    Applicant: SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQUE ET MICRO ONDES
    Inventors: Adrien Grandemenge, Jean-Marie Jacomino, Marilena Radoiu, Louis Latrasse
  • Patent number: 8776719
    Abstract: A microwave plasma reactor (10) comprises a reactor chamber, a microwave resonant cavity (14) located within the reactor chamber, a waveguide (16) for conveying microwave radiation to the resonant cavity, the waveguide having a convergent tapered portion, means for forming an electromagnetic standing wave within the resonant cavity from the microwave radiation for initiating and sustaining a plasma within the resonant cavity, the resonant cavity having a gas inlet and a gas outlet, and conduit means extending from the gas outlet for containing a plasma conveyed from the resonant cavity with a gas flowing from the gas inlet to the gas outlet.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: July 15, 2014
    Assignee: Edwards Limited
    Inventors: Marilena Radoiu, James Robert Smith, Andrew James Seeley
  • Patent number: 8518162
    Abstract: A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapor, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: August 27, 2013
    Assignee: Edwards Limited
    Inventors: James Robert Smith, Andrew James Seeley, Derek Martin Baker, Marilena Radoiu
  • Patent number: 8480861
    Abstract: In a method of treating a gas exhausted from a process chamber, the exhaust gas is conveyed to a vacuum pump (20) and a nitrogen purge gas is added to the exhaust gas for pumping with the exhaust gas. Gas exhaust from the pump is conveyed to an abatement device (28) for abating the exhaust gas. The amount of purge gas added to the exhaust gas is adjusted in response to a variation of the composition of the exhaust gas, or the composition of the gas supplied to the process chamber, to optimise the abatement of the exhaust gas.
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: July 9, 2013
    Assignee: Edwards Limited
    Inventors: James Robert Smith, Marilena Radoiu, Stephen John Coles
  • Patent number: 8168128
    Abstract: A plasma reactor (10) comprises a microwave resonant cavity (12) having a gas inlet (18) and a gas outlet (20), a waveguide (14) for conveying microwave radiation to the resonant cavity, and a plasma torch (40) for injecting into the resonant cavity a plasma stream containing ions for reacting with a gas flowing from the gas inlet (18) to the gas outlet (20).
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: May 1, 2012
    Assignee: Edwards Limited
    Inventors: Andrew James Seeley, Marilena Radoiu
  • Publication number: 20110197759
    Abstract: A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapour, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas.
    Type: Application
    Filed: July 27, 2006
    Publication date: August 18, 2011
    Applicant: THE BOC GROUP PLC
    Inventors: James Robert Smith, Andrew James Seeley, Derek Martin Baker, Marilena Radoiu
  • Publication number: 20100038230
    Abstract: In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
    Type: Application
    Filed: September 25, 2006
    Publication date: February 18, 2010
    Inventors: Marilena Radoiu, James Robert Smith, Andrew James Seeley
  • Publication number: 20090183684
    Abstract: A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapour.
    Type: Application
    Filed: September 21, 2006
    Publication date: July 23, 2009
    Inventor: Marilena Radoiu
  • Publication number: 20090165953
    Abstract: A plasma reactor (10) comprises a microwave resonant cavity (12) having a gas inlet (18) and a gas outlet (20), a waveguide (14) for conveying microwave radiation to the resonant cavity, and a plasma torch (40) for injecting into the resonant cavity a plasma stream containing ions for reacting with a gas flowing from the gas inlet (18) to the gas outlet (20).
    Type: Application
    Filed: September 26, 2006
    Publication date: July 2, 2009
    Inventors: Andrew James Seeley, Marilena Radoiu