Patents by Inventor Marinus Engelbertus Cornelis MUTSAERS

Marinus Engelbertus Cornelis MUTSAERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Projection system and lithographic apparatus comprising said projection system
    Patent number: 11550227
    Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: January 10, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Marinus Engelbertus Cornelis Mutsaers, Robertus Johannes Marinus De Jongh, Jeroen Pieter Starreveld
  • PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SAID PROJECTION SYSTEM
    Publication number: 20220082947
    Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.
    Type: Application
    Filed: December 13, 2019
    Publication date: March 17, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Marinus Engelbertus Cornelis MUTSAERS, Robertus Johannes Marinus DE JONGH, Jeroen Pieter STARREVELD