Patents by Inventor Marinus Jan Jan Van Der Pol

Marinus Jan Jan Van Der Pol has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system to process semiconductor wafers
    Patent number: 6732006
    Abstract: A method and system for the processing of one or more wafers in a process tool is provided, the method comprising subjecting the one or more wafer in a reaction chamber to a process, generating an inhibit next load flag on predefined conditions, the inhibit next load flag not effecting already started processing of a wafer. Prior to the start of the processing of a wafer, a check is performed to see if an inhibit next load flag has been set. When upon checking it has been found that an inhibit next load has been set, the start of the process in the reaction chamber is prohibited. The method further includes providing pre-programmed recovery procedures, such that after execution of a pre-programmed recovery procedure the to be processed wafer of which the start of the processing is prohibited ends in a defined state such that the tool can be used for further processing.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: May 4, 2004
    Assignee: ASM International NV
    Inventors: Kornelius Haanstra, Marinus Jan Jan Van Der Pol, Jan Zinger
  • Method and system to process semiconductor wafers
    Publication number: 20030149506
    Abstract: A method and system for the processing of one or more wafers in a process tool is provided, the method comprising subjecting the one or more wafer in a reaction chamber to a process, generating an inhibit next load flag on predefined conditions, the inhibit next load flag not effecting already started processing of a wafer. Prior to the start of the processing of a wafer, a check is performed to see if an inhibit next load flag has been set. When upon checking it has been found that an inhibit next load has been set, the start of the process in the reaction chamber is prohibited. The method further includes providing pre-programmed recovery procedures, such that after execution of a pre-programmed recovery procedure the to be processed wafer of which the start of the processing is prohibited ends in a defined state such that the tool can be used for further processing.
    Type: Application
    Filed: February 6, 2002
    Publication date: August 7, 2003
    Applicant: ASM International NV
    Inventors: Kornelius Haanstra, Marinus Jan Jan Van Der Pol, Jan Zinger