Patents by Inventor Marinus Petrus REIJNDERS
Marinus Petrus REIJNDERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11971663Abstract: Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in the light source, in particular stochastic variations. Feedback or feedforward approaches can be used for the correction of the source and/or the metrology outputs. An exemplary method of controlling the spectral output of a light source which emits a time-varying spectrum of light includes the steps of: determining at least one characteristic of the spectrum of light emitted from the light source; and using said determined characteristic to control the spectral output.Type: GrantFiled: July 7, 2020Date of Patent: April 30, 2024Assignee: ASML Netherlands B.V.Inventors: Marinus Petrus Reijnders, Hendrik Sabert, Patrick Sebastian Uebel
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Patent number: 11940739Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: December 27, 2021Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Publication number: 20230213868Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.Type: ApplicationFiled: June 4, 2021Publication date: July 6, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Mohamed SWILLAM, Marinus Petrus REIJNDERS
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Publication number: 20230058714Abstract: A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.Type: ApplicationFiled: December 8, 2020Publication date: February 23, 2023Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Marinus Petrus REIJNDERS, Mohamed SWILLAM
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Patent number: 11467505Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).Type: GrantFiled: October 12, 2017Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Marinus Petrus Reijnders
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Publication number: 20220291595Abstract: Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in the light source, in particular stochastic variations. Feedback or feedforward approaches can be used for the correction of the source and/or the metrology outputs. An exemplary method of controlling the spectral output of a light source which emits a time-varying spectrum of light includes the steps of: determining at least one characteristic of the spectrum of light emitted from the light source; and using said determined characteristic to control the spectral output.Type: ApplicationFiled: July 7, 2020Publication date: September 15, 2022Applicant: ASML Netherlands B.V.Inventors: Marinus Petrus REIJNDERS, Hendrik SABERT, Patrick Sebastian UEBEL
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Publication number: 20220172347Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.Type: ApplicationFiled: April 2, 2020Publication date: June 2, 2022Applicant: ASML Netherlands B.V.Inventors: Teunis Willem TUKKER, Arie Jefrey DEN BOEF, Nitesh PANDEY, Marinus Petrus REIJNDERS, Ferry ZIJP
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Publication number: 20220121127Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: December 27, 2021Publication date: April 21, 2022Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Duygu AKBULUT, Marimus Johannes Maria VAN DAM, Hans BUTLER, Hugo Augustinus Joseph CRAMER, Engelbertus Antonius Franciscus VAN DER PASCH, Ferry ZIJP, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Marinus Petrus REIJNDERS
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Patent number: 11262661Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: June 5, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Patent number: 11221565Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.Type: GrantFiled: March 13, 2019Date of Patent: January 11, 2022Assignee: ASML Netherlands B.V.Inventors: Simon Reinald Huisman, Marinus Petrus Reijnders
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Publication number: 20210072652Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.Type: ApplicationFiled: March 13, 2019Publication date: March 11, 2021Applicant: ASML Netherlands B.V.Inventors: Simon Reinald HUISMAN, Marinus Petrus REIJNDERS
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Publication number: 20200057390Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).Type: ApplicationFiled: October 12, 2017Publication date: February 20, 2020Inventors: Hans BUTLER, Johannes Petrus Martinus Bernardus VERMEULEN, Marinus Petrus REIJNDERS
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Publication number: 20190384184Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: June 5, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscu Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Raaymakers, Marinus Petrus Reijnders
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Patent number: 10241425Abstract: A level sensor to determine a height level of a substrate, that includes a projection unit including a projection grating having a period P, the projection grating configured to provide a patterned measurement beam, to the substrate, having a periodically varying intensity distribution in a first direction having the period P; a detection unit to receive a reflected patterned measurement beam after reflection on the substrate, the reflected patterned measurement beam having a periodically varying intensity distribution in a second direction, having the period P, wherein the detection unit has a sensor array to receive the reflected patterned measurement beam, the sensor array including a plurality of sensing elements arranged along the second direction at a pitch p smaller than or equal to half the period P, and a processing unit to determine the height level of the substrate based on a signal from the sensor.Type: GrantFiled: November 19, 2015Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventor: Marinus Petrus Reijnders
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Publication number: 20180341188Abstract: A level sensor to determine a height level of a substrate, that includes a projection unit including a projection grating having a period P, the projection grating configured to provide a patterned measurement beam, to the substrate, having a periodically varying intensity distribution in a first direction having the period P; a detection unit to receive a reflected patterned measurement beam after reflection on the substrate, the reflected patterned measurement beam having a periodically varying intensity distribution in a second direction, having the period P, wherein the detection unit has a sensor array to receive the reflected patterned measurement beam, the sensor array including a plurality of sensing elements arranged along the second direction at a pitch p smaller than or equal to half the period P, and a processing unit to determine the height level of the substrate based on a signal from the sensor.Type: ApplicationFiled: November 19, 2015Publication date: November 29, 2018Applicant: ASML NETHERLANDS B.V.Inventor: Marinus Petrus REIJNDERS