Abstract: An optical element for effecting a desired change in incident radiation at a plane of an illumination system of a lithographic apparatus comprises an array of cells manufactured as a single unit, each cell being arranged to redirect the incident radiation in a predetermined direction. An array of polarizing regions is also provided, each polarizing region being associated with a corresponding cell. Each cell arranged to redirect radiation in a first direction has associated with it a polarizing region ensuring that the redirected radiation has a first polarization, so that all of the radiation redirected in the first direction has the same polarization.

Abstract: An apparatus and method for imaging a pattern onto a substrate is described. A recipe for producing an image includes optional tool-type information. Where tool-type information indicates that the recipe pertains to a different tool type, the apparatus makes adjustments to its imaging settings in order to emulate performance of the different tool type.

Abstract: A lithographic apparatus includes an illuminator configured to provide a projection beam of radiation and a polarization controller configured to control an intensity of a preferred state of polarization of the projection beam. The lithographic apparatus further includes a support configured to hold a patterning device. The patterning device configured to pattern the projection beam according to a desired pattern. The apparatus also includes a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate.