Patents by Inventor Mario BERLINGER

Mario BERLINGER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • In-situ etch rate or deposition rate measurement system
    Patent number: 12469676
    Abstract: A system is provided for in-situ ion beam etch rate or deposition rate measurement, including: a vacuum chamber; an ion beam source configured to direct an ion beam onto a first surface of a sample located within the vacuum chamber and to etch the first surface of the sample with an etch rate; or a material source configured to deposit material onto a first surface of a sample located within the vacuum chamber with a deposition rate; and an interferometric measurement device located at least partially within the vacuum chamber and configured to direct light onto a second surface of the sample and to determine the etch rate of the ion beam or the deposition rate of the deposited material in-situ based on light reflected from the sample.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: November 11, 2025
    Assignee: Bühler Alzenau GmbH
    Inventors: Steffen Guertler, Mario Berlinger, Ralf Sperling
  • IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM
    Publication number: 20230139375
    Abstract: A system is provided for in-situ ion beam etch rate or deposition rate measurement, including: a vacuum chamber; an ion beam source configured to direct an ion beam onto a first surface of a sample located within the vacuum chamber and to etch the first surface of the sample with an etch rate; or a material source configured to deposit material onto a first surface of a sample located within the vacuum chamber with a deposition rate; and an interferometric measurement device located at least partially within the vacuum chamber and configured to direct light onto a second surface of the sample and to determine the etch rate of the ion beam or the deposition rate of the deposited material in-situ based on light reflected from the sample.
    Type: Application
    Filed: February 3, 2021
    Publication date: May 4, 2023
    Applicant: BÜHLER ALZENAU GMBH
    Inventors: Steffen GUERTLER, Mario BERLINGER, Ralf SPERLING