Abstract: A system for megasonic processing of an article. In one aspect, the system for megasonic processing comprises a rotary support for supporting an article, a dispenser for applying a fluid to a surface of an article positioned on the rotary support; and a transducer assembly. The transducer assembly comprises (i) a transmitter positioned adjacent to the article on the rotary support so that when the fluid is applied to the surface of the article via the dispenser, a meniscus of the fluid is formed between a portion of the transmitter and the surface of the article and (ii) not more than one transducer coupled to the transmitter, the transducer adapted to oscillate at a frequency for propagating megasonic energy through the transmitter and into the meniscus of the fluid.

Abstract: A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy oriented generally parallel to the substrate. The standing wave generates an associated pattern of high-agitation regions in the liquid. The method further comprises moving the standing wave back-and-forth so as to move the pattern of high-agitation regions about with respect to the substrate. An apparatus for cleaning substrates comprises a support to rotate the substrate about a first axis, and a transmitter extending generally parallel to a surface of the substrate. The apparatus further comprises a megasonic transducer in acoustically coupled relation to the transmitter, and a reciprocation drive in fixed relation to the transmitter. The reciprocation drive moves the transmitter back-and-forth within a plane generally parallel to the surface of the substrate.

Abstract: A method and apparatus for megasonic cleaning of substrates by placing the wafers in the far-field megasonic zone to eliminate sonic-induced damage to highly sensitive small-scale device structures that occurs in the near-field megasonic zone. Folded acoustic beam paths are defined by at least one reflector to achieve sufficient path length to the wafers. A reciprocally rotating reflector may be used to sweep the acoustic beam across the substrate surfaces.

Abstract: A transducer assembly used for the megasonic processing of an article. The transducer assembly comprises a vibration transmitter with an elongated edge capable of being positioned close to and substantially parallel to the surface of an article, where a meniscus of fluid forms between the article and transmitter. The transducer assembly also comprises a transducer coupled to the transmitter, where the transducer can oscillate to allow megasonic energy to propagate through the meniscus of the fluid. In one embodiment, the transducer assembly can further comprise a housing with openings for flowing a gas in and out of a space in the housing.

Abstract: A transducer assembly used for the megasonic processing of an article. In one aspect, the transducer assembly comprises: a vibration transmitter having a rear portion adapted to be supported adjacent to an article to be processed and having an elongated forward portion adapted to extend close to a surface of the article so that when a fluid is applied to the surface of the article, a meniscus of the fluid is formed between the elongated forward portion and the surface of the article; and a transducer coupled to the rear portion of the transmitter, the transducer adapted to oscillate at a frequency for propagating megasonic energy through the elongated forward portion of the transmitter and into the meniscus of the fluid. In one embodiment, the transducer assembly can further comprise a housing with at least one opening for flowing a gas into a space in the housing in contact with the transducer.