Patents by Inventor Mario Luenne

Mario Luenne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250091259
    Abstract: A process for producing a three-dimensional pressure-sensitive adhesive product (HKP) from radiation-induced reactive prepolymer composition (SRP), comprising the process steps: a. providing a negative mold (NF) for the pressure-sensitive adhesive product (HKP), b. filling the negative mold (NF) provided with the radiation-induced reactive prepolymer mass (SRP), c. radiation-induced chemical conversion of the prepolymer mass (SRP) to the pressure-sensitive adhesive product (HKP), and d. removal of the pressure-sensitive adhesive product (HKP) from the negative mold (NF). In order to overcome the disadvantages of conventional technology, the negative mold (NF) is produced by a thermoforming process using a positive mold (PF), a casting process for the radiation-induced reactive prepolymer mass (SRP) is used to fill the negative mold (NF) provided, and cooling (K) takes place during the radiation-induced chemical conversion of the prepolymer mass (SRP) to the pressure-sensitive adhesive product (HKP).
    Type: Application
    Filed: January 21, 2022
    Publication date: March 20, 2025
    Inventors: Jochen Ringelkamp, Jan Wieneke, Mario Luenne
  • Publication number: 20220228034
    Abstract: A method for manufacturing a pressure-sensitive self-adhering adhesive is based on an alkoxylated silane-containing polymer, to which is added at least one tackifying resin compatible with the alkoxylated, silane-containing polymer, and at least one catalyst (K). To overcome various disadvantages of the prior art, such as a too-slow or excessively violent reaction of the alkoxyl groups, and the need for an additional supplying of water, the alkoxylated silane-containing polymer is crosslinked using a catalyst (K) that comprises a Lewis acid-base adduct, wherein the Lewis acid (LS) is a reaction-inhibited cation at least in the temperature range below 60° C., and the Lewis base (LB) is an anion of a very strong acid. In a preferred embodiment the Lewis acid (LS) is an organyl-group-containing (AG) halogen-onium cation, and the Lewis base (LB) is the anion of a superacid.
    Type: Application
    Filed: May 20, 2020
    Publication date: July 21, 2022
    Inventor: Mario Luenne