Abstract: An actuator-sensor device for an optics module of a lithography apparatus comprises: an actuator-sensor unit having an actuator and a sensor; a control unit electrically connected to the actuator-sensor unit; and a support element which on a first supporting side of same supports the actuator-sensor unit and which on a second supporting side of same supports the control unit, with the second supporting side being opposite to the first supporting side.

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.

Abstract: Apparatus for detecting optical radiation emitted from an array of spots on an object. The apparatus includes a plurality of light guides having respective input ends and output ends, with the input ends ordered in a geometrical arrangement corresponding to the array of the spots. Relay optics collect and focus the optical radiation from the object onto the input ends such that each input end receives the optical radiation from a corresponding one of the spots. Multiple detectors and each coupled to receive the optical radiation from an output end of a respective one of the light guides.

Abstract: A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.

Abstract: A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.

Abstract: Apparatus for detecting optical radiation emitted from an array of spots on an object. The apparatus includes a plurality of light guides having respective input ends and output ends, with the input ends ordered in a geometrical arrangement corresponding to the array of the spots. Relay optics collect and focus the optical radiation from the object onto the input ends such that each input end receives the optical radiation from a corresponding one of the spots. Multiple detectors and each coupled to receive the optical radiation from an output end of a respective one of the light guides.