Abstract: Doped quartz glass components for use in a plasma-assisted manufacturing process contain at least one dopant which is capable of reacting with fluorine to form a fluoride compound, and the fluoride compound has a boiling point higher than that of SiF4. The doped quartz glass component has high dry-etch resistance and low particle formation, and has uniform etch removal when used in a plasma-assisted manufacturing process. The doped quartz glass has a microhomogeneity defined by (a) a surface roughness with an Ra value of less than 20 nm after the surface has been subjected to a dry-etching procedure as specified in the description, or (b) a dopant distribution with a lateral concentration profile in which maxima of the dopant concentration are at an average distance apart of less than 30 ?m.

Abstract: A method for producing a component with portions of a rare earth metal-doped quartz glass, an intermediate product containing voids and consisting of a SiO2 raw material doped with rare earth metal is introduced into a sinter mold the interior of which is bordered by a carbonaceous mold wall, and is melted therein into the component by gas pressure sintering at a maximum temperature above 1500° C. A shield is arranged between the mold wall and the intermediate product. In order to indicate a modified gas pressure sintering method that ensures the production of rare earth metal-doped quartz glass with reproducible properties, a bulk material of amorphous SiO2 particles with a layer thickness of at least 2 mm is used as the shield, the softening temperature thereof being at least 20° C.

Abstract: A method for producing a component with portions of a rare earth metal-doped quartz glass, an intermediate product containing voids and consisting of a SiO2 raw material doped with rare earth metal is introduced into a sinter mold the interior of which is bordered by a carbonaceous mold wall, and is melted therein into the component by gas pressure sintering at a maximum temperature above 1500° C. A shield is arranged between the mold wall and the intermediate product. In order to indicate a modified gas pressure sintering method that ensures the production of rare earth metal-doped quartz glass with reproducible properties, a bulk material of amorphous SiO2 particles with a layer thickness of at least 2 mm is used as the shield, the softening temperature thereof being at least 20° C.

Abstract: The invention relates to a process for producing SiO2 granules by freezing and re-thawing an SiO2 suspension, wherein a separation of liquid and sediment composed of agglomerated SiO2 particles occurs in the course of thawing, the liquid removed is decanted and the residual moisture in the sediment is removed by a drying step with formation of the SiO2 granules. According to the invention, an auxiliary comprising alkali metal-free bases in the form of nitrogen hydrides is added to the suspension to set the pH greater than 7.

Abstract: A UV lamp including a filter material of doped quartz glass is provided that effects a transparency as high as possible for operating radiation in the ultraviolet spectral range above 210 nm together with low transparency in the wavelength range below about 190 nm. The filter material of doped quartz glass includes at least 99 wt. % of SiO2 and Al2O3, wherein the Al2O3 portion is in the range of 2 wt. % to 4 wt. The filter material has an edge wavelength at a wavelength below 190 nm and a spectral transmission of 80% mm?1 or higher at a wavelength of 210 nm.

Abstract: A UV lamp including a filter material of doped quartz glass is provided that effects a transparency as high as possible for operating radiation in the ultraviolet spectral range above 210 nm together with low transparency in the wavelength range below about 190 nm. The filter material of doped quartz glass includes at least 99 wt. % of SiO2 and Al2O3, wherein the Al2O3 portion is in the range of 2 wt. % to 4 wt. The filter material has an edge wavelength at a wavelength below 190 nm and a spectral transmission of 80% mm?1 or higher at a wavelength of 210 nm.

Abstract: The invention relates to a method for producing a doped SiO2 slurry in which an SiO2 suspension is brought into interaction with at least one doping solution, wherein the SiO2 suspension and/or the doping solution act on one another in the form of an atomized spray, the average droplet diameter of which is in the range between 10 ?m and 100 ?m. The invention further relates to the use of an SiO2 slurry doped by the atomized spray method for the production of doped quartz glass, particularly for the production of laser-active quartz glass.

Abstract: The invention describes a method for the manufacture of quartz glass that comprises not only doping with rare earth elements and/or transition metals, but also fluorination of the quartz glass. The method described presently allows the diffusion of the dopants during fluorination to be prevented. Moreover, the invention relates to the quartz glass that can be obtained according to the method according to the invention and the use thereof as laser-active quartz glass, for generating light-guiding structures, and in optical applications.

Abstract: The invention relates to a method for producing a doped SiO2 slurry in which an SiO2 suspension is brought into interaction with at least one doping solution, wherein the SiO2 suspension and/or the doping solution act on one another in the form of an atomised spray, the average droplet diameter of which is in the range between 10 ?m and 100 ?m. The invention further relates to the use of an SiO2 slurry doped by the atomised spray method for the production of doped quartz glass, particularly for the production of laser-active quartz glass.

Abstract: The invention relates to a process for producing SiO2 granules by freezing and re-thawing an SiO2 suspension, wherein a separation of liquid and sediment composed of agglomerated SiO2 particles occurs in the course of thawing, the liquid removed is decanted and the residual moisture in the sediment is removed by a drying step with formation of the SiO2 granules. According to the invention, an auxiliary comprising alkali metal-free bases in the form of nitrogen hydrides is added to the suspension to set the pH greater than 7.

Abstract: The invention relates to a method allowing cost-effective production of doped quartz glass, particularly laser-active quartz glass, that is improved with regard to the homogeneity of the doping material distribution, in that a suspension is provided comprising SiO2 particles and an initial compound for at least one doping material in an aqueous fluid, the fluid being removed under formation of a doped intermediate product comprising particles of the doping material or particles of the precursor substance or the doping material, and the doped quartz glass is formed by sintering the doped intermediate product, wherein at least part of the particles of the doping material or the particles of the precursor substance of the same is generated in the suspension as a precipitate of a pH-value-controlled precipitation reaction of the initial compound.

Abstract: The invention relates to a method allowing cost-effective production of doped quartz glass, particularly laser-active quartz glass, that is improved with regard to the homogeneity of the doping material distribution, in that a suspension is provided comprising SiO2 particles and an initial compound for at least one doping material in an aqueous fluid, the fluid being removed under formation of a doped intermediate product comprising particles of the doping material or particles of the precursor substance or the doping material, and the doped quartz glass is formed by sintering the doped intermediate product, wherein at least part of the particles of the doping material or the particles of the precursor substance of the same is generated in the suspension as a precipitate of a pH-value-controlled precipitation reaction of the initial compound.