Abstract: An electron bombardment ion source assembly for use in a mass spectrometer and including an anode extending along an axis and surrounding an ionization volume. At least two filaments are each configured to thermionically emit electrons and are positioned outside the ionization volume and proximate to the anode. The at least two filaments each comprise an elliptically-shaped portion and non-elliptical portions on either end of the elliptically-shaped portion. The non-elliptically-shaped portions are configured to be mounted in a fixed position relative to the anode to maintain a constant distance between the elliptically-shaped portion and the anode. The elliptically-shaped portion extends along a plane that intersects a plane perpendicular to the axis of the anode at a non-zero angle.

Abstract: A plasma generation device for generating a plasma comprises a support having a first side and an opposing second side. The support is comprised of a ceramic matrix and a split-ring conductor is embedded in the ceramic matrix. A hermetically sealed via extends from the split-ring conductor to the second side of the support and connects to an electrical supply. A ground plane is formed on the second side of the support. A plasma is generated proximate to the first side of the support, and the support seals to a wall of the chamber such that the first side is exposed to the one or more gases inside the chamber and the second side is isolated from the plasma and the one or more gases inside of the chamber.

Abstract: An electron bombardment ion source assembly for use in a mass spectrometer and including an anode extending along an axis and surrounding an ionization volume. At least two filaments are each configured to thermionically emit electrons and are positioned outside the ionization volume and proximate to the anode. The at least two filaments each comprise an elliptically-shaped portion and non-elliptical portions on either end of the elliptically-shaped portion. The non-elliptically-shaped portions are configured to be mounted in a fixed position relative to the anode to maintain a constant distance between the elliptically-shaped portion and the anode. The elliptically-shaped portion extends along a plane that intersects a plane perpendicular to the axis of the anode at a non-zero angle.

Abstract: The invention relates to a method 100 for determining a pressure in a vacuum system, wherein the method comprises the steps of: a) generating 101 a plasma in a sample chamber which is fluid-dynamically connected to the vacuum system and which is in electrical contact with a first electrode and a second electrode; b) measuring 102 a current intensity of an electrical current flowing through the plasma between the first electrode and the second electrode; c) measuring 103 a first radiation intensity of electromagnetic radiation of a first wavelength range which is emitted from the plasma, wherein the first wavelength range contains at least a first emission line of a first plasma species of a first chemical element; d) measuring 104 a second radiation intensity of electromagnetic radiation of a second wavelength range which is emitted from the plasma, wherein the second wavelength range contains a second emission line of the first plasma species of the first chemical element or of a second plasma species of

Abstract: A plasma generation device for generating a plasma comprises a support having a first side and an opposing second side. The support is comprised of a ceramic matrix and a split-ring conductor is embedded in the ceramic matrix. A hermetically sealed via extends from the split-ring conductor to the second side of the support and connects to an electrical supply. A ground plane is formed on the second side of the support. A plasma is generated proximate to the first side of the support, and the support seals to a wall of the chamber such that the first side is exposed to the one or more gases inside the chamber and the second side is isolated from the plasma and the one or more gases inside of the chamber.

Abstract: A time-of-flight mass spectrometer assembly includes a flange with a vacuum chamber facing surface and an environment facing surface. The flange defines an opening that extends between the vacuum chamber facing surface and the environment facing surface. A plurality of stacked components are supported by the vacuum chamber facing surface of the flange. A secondary flange is removably secured within the opening of the flange. The secondary flange includes a vacuum chamber facing surface and an environment facing surface. A supported spectrometer component is supported by the vacuum chamber facing surface of the secondary flange such that removal of the secondary flange from the flange acts to remove the supported component from the plurality of stacked components supported by the vacuum chamber facing surface of the flange.

Abstract: A time-of-flight mass spectrometer assembly includes a flange with a vacuum chamber facing surface and an environment facing surface. The flange defines an opening that extends between the vacuum chamber facing surface and the environment facing surface. A plurality of stacked components are supported by the vacuum chamber facing surface of the flange. A secondary flange is removably secured within the opening of the flange. The secondary flange includes a vacuum chamber facing surface and an environment facing surface. A supported spectrometer component is supported by the vacuum chamber facing surface of the secondary flange such that removal of the secondary flange from the flange acts to remove the supported component from the plurality of stacked components supported by the vacuum chamber facing surface of the flange.

Abstract: The invention relates to a method 100 for determining a pressure in a vacuum system, wherein the method comprises the steps of: a) generating 101 a plasma in a sample chamber which is fluid-dynamically connected to the vacuum system and which is in electrical contact with a first electrode and a second electrode; b) measuring 102 a current intensity of an electrical current flowing through the plasma between the first electrode and the second electrode; c) measuring 103 a first radiation intensity of electromagnetic radiation of a first wavelength range which is emitted from the plasma, wherein the first wavelength range contains at least a first emission line of a first plasma species of a first chemical element; d) measuring 104 a second radiation intensity of electromagnetic radiation of a second wavelength range which is emitted from the plasma, wherein the second wavelength range contains a second emission line of the first plasma species of the first chemical element or of a second plasma species of th