Patents by Inventor Marion Ewald

Marion Ewald has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10351579
    Abstract: A monoallophanate can be used in paint or adhesive compositions. The monoallophanate has the formula 1: where R, R1-R6 are each independently identical or different hydrocarbyl radicals having 1-8 carbon atoms, which may be branched or cyclic, or else may be integrated together to form a cyclic system, and m and n are each independently 0-2.
    Type: Grant
    Filed: October 11, 2016
    Date of Patent: July 16, 2019
    Assignee: Evonik Degussa GmbH
    Inventors: Emmanouil Spyrou, Manfred Kreczinski, Tobias Unkelhaeusser, Sabine Naumann, Holger Loesch, Marion Ewald, Thomas Weihrauch
  • Publication number: 20180327432
    Abstract: A monoallophanate can be used in paint or adhesive compositions. The monoallophanate has the formula 1: where R, R1-R6 are each independently identical or different hydrocarbyl radicals having 1-8 carbon atoms, which may be branched or cyclic, or else may be integrated together to form a cyclic system, and m and n are each independently 0-2.
    Type: Application
    Filed: October 11, 2016
    Publication date: November 15, 2018
    Applicant: EVONIK DEGUSSA GMBH
    Inventors: Emmanouil Spyrou, Manfred Kreczinski, Tobias Unkelhaeusser, Sabine Naumann, Holger Loesch, Marion Ewald, Thomas Weihrauch
  • Publication number: 20170029656
    Abstract: A coating, adhesive or sealant contains a non-aqueous dispersion, containing A) a liquid phase containing at least one liquid polyolefin having an OH group, B) at least one reactive polyurethane (PUR) component, and C) optionally a further auxiliary, an additive or both, wherein the reactive polyurethane component B) is in fine distribution with a median particle diameter d50 of <100 ?m in the liquid phase of component A).
    Type: Application
    Filed: July 28, 2016
    Publication date: February 2, 2017
    Applicant: Evonik Degussa GmbH
    Inventors: Emmanouil SPYROU, Holger LOESCH, Andrea DIESVELD, Marion EWALD, Niko HABERKORN
  • Publication number: 20160251472
    Abstract: Polyfunctional urethane (meth)acrylates comprising low-monomer-content diisocyanate monoadducts
    Type: Application
    Filed: September 30, 2014
    Publication date: September 1, 2016
    Applicant: EVONIK DEGUSSA GMBH
    Inventors: Emmanouil SPYROU, Holger LOESCH, Marion EWALD, Laura RAMON-GIMENEZ, Andrea THESING
  • Publication number: 20160177123
    Abstract: A thermally curable and radiation-curable formulation, contains A) 45% to 99.9% by weight of at least one radiation-curable component; and B) 0.1% to 5% by weight of at least one selected free-radically initiating photo-initiator; and optionally C) 0.01% to 50% by weight of at least one additive; wherein the sum total of A) and B) and any C) is 100% by weight. The formulation is curable with actinic radiation and/or thermally and is used, for example, for the production of pigmented and pigment-free coating materials, and for adhesives and sealants.
    Type: Application
    Filed: December 4, 2015
    Publication date: June 23, 2016
    Applicant: Evonik Degussa GmbH
    Inventors: Emmanouil SPYROU, Zuhal Tuncay, Andrea Diesveld, Marion Ewald, Holger Loesch
  • Publication number: 20150197674
    Abstract: The invention relates to a composition comprising components which are selected from A) at least one compound containing at least one carbodiimide group, B) at least one compound containing at least one carboxylic anhydride group, C) optionally solvents and D) optionally excipients and additives. The invention also relates to a method for producing, and also using, same.
    Type: Application
    Filed: September 9, 2013
    Publication date: July 16, 2015
    Applicant: Evonik Degussa GmbH
    Inventors: Emmanouil Spyrou, Friedrich Georg Schmidt, Marion Ewald, Susanne Kreischer, Andrea Henschke