Abstract: The present invention relates to a method for producing, for the depiction of a specified motif, a micro-optical depiction arrangement (30) that exhibits a colored motif grid, composed of a plurality of micromotif elements (50, 52), and a focusing element grid, composed of a plurality of microfocusing elements (40), that reconstructs the specified motif when the micromotif elements (50, 52) are viewed, and in the method, T1) a first substrate foil (32) having opposing main surfaces (34, 36) is provided, and an embossing lacquer (38) is applied on a first main surface (34) of the first substrate foil (32) and is embossed in the form of the focusing element grid composed of an at least locally periodic arrangement of a plurality of microfocusing elements (40), T2) a second substrate foil (42) having opposing main surfaces (44, 46) is provided, and an arrangement of colored micromotif elements (50, 52) is produced in the form of the motif grid on a first main surface (44) of the second substrate foil (42), and

Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

Abstract: The present invention relates to a method for manufacturing a security element (12) having a metalized microrelief pattern and a negative pattern in register therewith, in which P) a substrate (20) is provided with an embossing pattern having elevations (24) and depressions (26) that form first and second regions having different first and second height levels, wherein the desired microrelief pattern (28) is introduced into the first regions of the embossing pattern, and the second regions of the embossing pattern are developed in the form of the desired negative pattern, M) the embossing pattern with the first and second regions is contiguously metalized (30), and L) the metalized embossing pattern is impinged on with laser radiation, to selectively remove the metalization (30) in the second regions of the embossing pattern through the action of the laser radiation.

Abstract: The invention relates to sheet material having an electrical circuit and to apparatuses and methods for processing said sheet material. The present invention describes sheet material having an electrical circuit as well as apparatuses and methods for processing same, which reduce the effort required for processing the sheet material and/or facilitate processing and/or improve it and/or make it more reliable. For this purpose, the sheet material has at least one electrical circuit, with energy and/or data being transmitted from the apparatus to the electrical circuit and/or from the electrical circuit to the apparatus and at least part of the transmitted data being used for processing.

Abstract: The present invention relates to a security element (20) for security papers, value documents and the like, having a feature region (24) that selectively influences incident electromagnetic radiation (30). According to the present invention, it is provided that the feature region (24) includes metallic nanopatterns (28) in which volume or surface plasmons are excited and/or resonance effects are caused by the incident electromagnetic radiation (30).

Abstract: The present invention relates to a security element (20) for security papers, value documents and the like, having a substrate (22) and an opaque metallization 24, 26) arranged on the substrate. According to the invention in the security element is provided, that the metallization (24, 26) comprises a first opaque metal layer (24) and a second opaque metal layer (26) arranged above the first metal layer (24), and that the two metal layers (24, 26) have substantially the same tone of color in the visible spectral region.

Abstract: The present invention relates to a see-through security element (12), for security papers, value documents and the like, having at least one micropattern having a visual appearance that is viewing-angle dependent when looked through (26, 28). According to the present invention, the at least one micropattern is formed from an arrangement of a plurality of pattern elements (24) having a characteristic pattern spacing of 1 ?m or more, and the see-through security element (12) exhibits a total thickness of 50 ?m or less.

Abstract: The present invention relates to a method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid composed of a plurality of micromotif elements and a focusing element grid composed of a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, in which a) a motif grid composed of an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice is provided, b) a focusing element grid composed of an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice is provided, c) a pattern repeat of the motif grid and/or of the focusing element grid on the endless material is specified, d) it is checked whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if this is not the case, a line

Abstract: The present invention relates to a highly refractive embossing lacquer for producing micro-optic arrangements which contains at least one binding agent which has at least one radiation-curing compound system consisting of one or more organic compounds. The highly refractive embossing lacquer is characterized in that at least a portion of the organic compounds of the radiation-curing compound system consists of molecules with at least one polarizable element, so that a polymeric material with a refractive index of greater than 1.5 is formed upon radiation curing. The invention also relates to a security element which is produced with at least one micro-optic authenticity feature. Micro-optic authenticity features according to the present invention permit the production of security elements that are so thin that they can be easily incorporated into value documents.

Abstract: The present invention relates to a grating image having one or more grating fields, each of which includes an electromagnetic radiation-influencing grating pattern comprising a plurality of grating lines, the grating lines being characterized by the parameters orientation, curvature, spacing and profile. According to the present invention, in the grating image, a grating field (30) that is separately perceptible with the naked eye includes an electromagnetic radiation-influencing grating pattern having grating lines (32) for which at least one of the characteristic parameters orientation, curvature, spacing and profile varies (34) across the surface of the grating field.

Abstract: The present invention relates to a security element for security papers, value documents and the like, having a micro-optical moiré magnification arrangement having a motif image (30) that consists of a planar periodic or at least locally periodic arrangement of a plurality of micromotif elements (36, 38), and a planar periodic or at least locally periodic arrangement of a plurality of microfocusing elements for the moiré-magnified viewing of the micromotif elements (36, 38) of the motif image, the motif image (30) including two or more sub-regions (32, 34) having micromotif elements (36, 38) that differ from each other in their contrast, and wherein the shape of the sub-regions (32, 34) forms, due to the contrast differences in the micromotif elements (36, 38), a perceptible macroscopic piece of image information in the form of characters, patterns or codes.

Abstract: The present invention relates to a method for applying a colored or colorless micropattern to a support, in which a) a die form (40) is prepared whose surface exhibits an arrangement of elevations (42) and depressions (44) in the form of the desired micropattern, b) the depressions (44) in the die form are filled with a curable colored or colorless lacquer (26), c) the support (20, 30) is pretreated for a good anchoring of the colored or colorless lacquer (26), d) the surface of the die form (40) is brought into contact with the support (20, 30), e) the lacquer (26) that is in contact with the support (20, 30) in the depressions in the die form (40) is cured and, in the process, joined with the support (20, 30), and f) the surface of the die form (40) is removed from the support (20, 30) again such that the cured lacquer (26) that is joined with the support (20, 30) is pulled out of the depressions (44) in the die form (40).

Abstract: The present invention relates to an optically variable security element (20) for securing valuable articles, having an achromatically reflective micropattern in the form of a mosaic (22) composed of a plurality of achromatically reflective mosaic elements (26-1, 26-2) that are characterized by the parameters size, contour shape, relief shape, reflectivity and spatial orientation and that form a predefined motif in that different groups of mosaic elements (26-1, 26-2) having different characteristic parameters reflect incident light (28) in different spatial regions (30). Said mosaic elements (26-1, 26-2) exhibit a lateral dimension below the resolution limit of the eye.

Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

Abstract: The present invention relates to a grating image (12) for depicting at least one unscreened halftone image having multiple brightness levels, the grating image exhibiting multiple grating fields (22-1, 22-2, 22-3) that include in each case an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines and that, when illuminated, produce in each case an areal region of the halftone image having the same brightness level.

Abstract: The present invention relates to a security element for protecting valuable articles, having a first and a second authenticating feature. The first authenticating feature comprises a first arrangement having a plurality of focusing elements present in a first grid, and a second arrangement having a plurality of microscopic structures present in a second grid. Here, the first and second arrangement are disposed in such a way that the microscopic structures of the second arrangement are seen magnified when viewed through the focusing elements of the first arrangement. The second authenticating feature is machine and/or visually verifiable and is not influenced by the first arrangement of the first authenticating feature.

Abstract: The present invention relates to a grating image having one or more grating fields, each of which includes an electromagnetic radiation-influencing grating pattern comprising a plurality of grating lines, the grating lines being characterized by the parameters orientation, curvature, spacing and profile. According to the present invention, in the grating image, a grating field (30) that is separately perceptible with the naked eye includes an electromagnetic radiation-influencing grating pattern having grating lines (32) for which at least one of the characteristic parameters orientation, curvature, spacing and profile varies (34) across the surface of the grating field.

Abstract: The invention relates to sheet material having an electrical circuit and to apparatuses and methods for processing said sheet material. The present invention describes sheet material having an electrical circuit as well as apparatuses and methods for processing same, which reduce the effort required for processing the sheet material and/or facilitate processing and/or improve it and/or make it more reliable. For this purpose, the sheet material has at least one electrical circuit, with energy and/or data being transmitted from the apparatus to the electrical circuit and/or from the electrical circuit to the apparatus and at least part of the transmitted data being used for processing.