Patents by Inventor Mariya Vyacheslavivna MEDVEDYEVA
Mariya Vyacheslavivna MEDVEDYEVA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11531274Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.Type: GrantFiled: December 28, 2020Date of Patent: December 20, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
-
Patent number: 11506566Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.Type: GrantFiled: December 10, 2018Date of Patent: November 22, 2022Assignee: ASML Netherlands B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Satej Subhash Khedekar, Bert Verstraeten, Bastiaan Onne Fagginer Auer
-
Publication number: 20210191280Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.Type: ApplicationFiled: December 28, 2020Publication date: June 24, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
-
Patent number: 10585048Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.Type: GrantFiled: April 16, 2019Date of Patent: March 10, 2020Assignee: ASML Netherlands B.V.Inventors: Samee Ur Rehman, Anagnostis Tsiatmas, Sergey Tarabrin, Joannes Jitse Venselaar, Alexandru Onose, Mariya Vyacheslavivna Medvedyeva
-
Patent number: 10585354Abstract: Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.Type: GrantFiled: January 24, 2019Date of Patent: March 10, 2020Assignee: ASML Netherlands B.V.Inventors: Anagnostis Tsiatmas, Joannes Jitse Venselaar, Samee Ur Rehman, Mariya Vyacheslavivna Medvedyeva, Bastiaan Onne Fagginger Auer, Martijn Maria Zaal, Thaleia Kontoroupi
-
Patent number: 10571363Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.Type: GrantFiled: January 22, 2019Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Mariya Vyacheslavivna Medvedyeva, Anagnostis Tsiatmas, Hugo Augustinus Joseph Cramer, Martinus Hubertus Maria Van Weert, Bastiaan Onne Fagginger Auer, Xiaoxin Shang, Johan Maria Van Boxmeer, Bert Verstraeten
-
Patent number: 10488768Abstract: A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.Type: GrantFiled: August 28, 2018Date of Patent: November 26, 2019Assignee: ASML Netherlands B.V.Inventors: Bastiaan Onne Fagginger Auer, Paul Christiaan Hinnen, Hugo Augustinus Joseph Cramer, Anagnostis Tsiatmas, Mariya Vyacheslavivna Medvedyeva
-
Publication number: 20190323972Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.Type: ApplicationFiled: April 16, 2019Publication date: October 24, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Samee Ur REHMAN, Anagnostis TSIATMAS, Sergey TARABRIN, Joannes Jitse VENSELAAR, Alexandru ONOSE, Mariya Vyacheslavivna MEDVEDYEVA
-
Publication number: 20190243253Abstract: Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.Type: ApplicationFiled: January 24, 2019Publication date: August 8, 2019Inventors: Anagnostis TSIATMAS, Joannes Jitse Venselaar, Samee Ur Rehman, Mariya Vyacheslavivna Medvedyeva, Bastiaan Onne Fagginger Auer, Martijn Maria Zaal, Thaleia Kontoroupi
-
Publication number: 20190242782Abstract: Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.Type: ApplicationFiled: January 22, 2019Publication date: August 8, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna MEDVEDYEVA, Anagnostis TSIATMAS, Hugo Augustinus Joseph CRAMER, Martinus Hubertus Maria VAN WEERT, Bastiaan Onne FAGGINGER AUER, Xiaoxin SHANG, Johan Maria VAN BOXMEER, Bert VERSTRAETEN
-
Publication number: 20190204180Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.Type: ApplicationFiled: December 10, 2018Publication date: July 4, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Mariya Vyacheslavivna MEDVEDYEVA, Maria Isabel DE LA FUENTE VALENTIN, Satej Subhash KHEDEKAR, Bert VERSTRAETEN, Bastiaan Onne FAGGINGER AUER
-
Publication number: 20190072860Abstract: A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.Type: ApplicationFiled: August 28, 2018Publication date: March 7, 2019Applicant: ASML NETHERLANDS B. V.Inventors: Bastiaan Onne FAGGINGER AUER, Paul Christiaan HINNEN, Hugo Augustinus Joseph CRAMER, Anagnostis TSIATMAS, Mariya Vyacheslavivna MEDVEDYEVA