Patents by Inventor Marja N. Mullings

Marja N. Mullings has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition
    Patent number: 8084087
    Abstract: A method of growing spatially-separated and size-controlled particles on substrate surfaces is provided. The method utilizes chemical modification of the substrate surface, an atomic layer deposition (ALD) system, providing a modified layer to the substrate surface and providing an ALD material for nanoparticle deposition. The method induces a Volmer-Weber growth method, where islands of the nanoparticles are formed on the surface. The modified layer controls a number of nucleation sites on the surface, where controlling the number of ALD cycles limits an amount of deposited the material for discrete the nanoparticles.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: December 27, 2011
    Assignees: The Board of Trustees of the Leland Stanford Junior University, Honda Motor Co., Ltd.
    Inventors: Stacey F. Bent, Rong Chen, Xirong Jiang, Marja N. Mullings, Yuji Saito
  • Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition
    Publication number: 20080274282
    Abstract: A method of growing spatially-separated and size-controlled particles on substrate surfaces is provided. The method utilizes chemical modification of the substrate surface, an atomic layer deposition (ALD) system, providing a modified layer to the substrate surface and providing an ALD material for nanoparticle deposition. The method induces a Volmer-Weber growth method, where islands of the nanoparticles are formed on the surface. The modified layer controls a number of nucleation sites on the surface, where controlling the number of ALD cycles limits an amount of deposited the material for discrete the nanoparticles.
    Type: Application
    Filed: February 14, 2008
    Publication date: November 6, 2008
    Inventors: Stacey F. Bent, Rong Chen, Xirong Jiang, Marja N. Mullings, Yuji Saito