Abstract: In one aspect, a system includes a device controller, processing clusters, and processing elements. The device controller includes a device event status register configured to store bits corresponding to (i) a global event signal provided by an external source and (ii) a device event signal provided by a device event control register. A processing cluster includes a cluster event register configured to store bits corresponding to (i) the global event signal provided by the external source, (ii) the device event signal provided by the device event control register, and (iii) a cluster event signal. A processing element includes an element event register configured to store bits corresponding to (i) the global event signal provided by the external source, (ii) the device event signal provided by the device event control register, (iii) the cluster event signal provided by the cluster event register, and (iv) a processing element event signal.

Abstract: A process for forming a bipolar transistor where the doping implantation of the extrinsic base regions does not affect the emitter doping levels. The techniques is to not remove the photoresist layer used to define the poly emitter contact. The photoresist layer for defining the extrinsic base regions overlays the photoresist layer over the emitter poly. When the base photoresist is processed to expose the base regions the photoresist over the emitter poly remains in tact. In this arrangement the base implantation is prevented from driving through the emitter poly and affecting the doping levels in the emitter.