Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.

Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.

Abstract: Spurious electrodynamic effects are reduced or eliminated by the use of a mechanically compact, low capacitance, geometrically symmetric, differentially-driven blanker assembly. This eliminates the need for internal cables or SMA-type launchers and has a solid metal electromechanical contact to system ground.

Abstract: An improved electron or ion gun support structure includes a hollow cylinder for rigidly connecting the source assembly to the source-motion ring, with the source cathode and associated lens extending into the hollow portion of the cylinder. The gun is thus made very stable and less susceptible to outside vibrations.

Abstract: A field emission source is used in conjunction with a three element asymmetric lens system to provide an electron gun having greater magnitude beam currents focused on a smaller spot size than has been previously possible for intermediate energy beams. The three element asymmetric lens system has a lower spherical aberration than prior art electrostatic guns and a very low chromatic aberration coefficient, enabling precise focusing of beams with large currents and energy spreads. The electron gun produces high current densities in beam focused on small spot areas, despite the relatively large acceptance angle and energy spread of the source beams.

Abstract: An arc suppressor is provided for an electron gun of the type used e.g. in semiconductor lithography equipment. The arc suppressor prevents damaging emission properties of the electron gun either due to variation of the cathode work function or any damage to the emitter apex. The arc suppressor includes a resistance and an inductor in series with each electrode lead providing voltage or current to the various electrodes of the electron gun. The inductance is provided by a ferrite toroid which contains a plurality of holes in addition to the main central hole. The leads for each electrode are wrapped around the toroid through the various holes, with one hole being provided for each lead. Thus advantageously each lead is isolated magnetically from the others, reducing the transformer and capacitive effects that couple one lead to another.