Patents by Inventor Mark A. Hackler

Mark A. Hackler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11858252
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Grant
    Filed: September 7, 2022
    Date of Patent: January 2, 2024
    Assignee: DUPONT ELECTRONICS, INC.
    Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
  • Publication number: 20230311473
    Abstract: The invention pertains to a printing form precursor, and particularly a printing form precursor that can form printing forms, or printing plates, having improved properties. The printing form precursor includes a photopolymerizable composition containing an additive having a structure of Formula (I). The presence of the additive results in ease of processing and/or better cleanout and reduction in webmarkings on solid areas of the printing form.
    Type: Application
    Filed: March 21, 2023
    Publication date: October 5, 2023
    Inventors: Adrian Lungu, VIOLETA LUNGU, MARK A HACKLER
  • Publication number: 20230001684
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Application
    Filed: September 7, 2022
    Publication date: January 5, 2023
    Inventors: Robert M Blomquist, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
  • Patent number: 11465402
    Abstract: A photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and a process of making the photosensitive element are disclosed. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: October 11, 2022
    Assignee: DUPONT ELECTRONICS, INC.
    Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
  • Publication number: 20200254749
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Application
    Filed: April 24, 2020
    Publication date: August 13, 2020
    Inventors: Robert M. Blomquist, Bradley K. Taylor, John Stephen Locke, Mark A. Hackler
  • Patent number: 10668711
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: June 2, 2020
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
  • Publication number: 20160355004
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Application
    Filed: May 26, 2016
    Publication date: December 8, 2016
    Inventors: ROBERT M BLOMQUIST, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
  • Patent number: 8573120
    Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
    Type: Grant
    Filed: May 20, 2013
    Date of Patent: November 5, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Mark A Hackler, Anandkumar R Kannurpatti, Robert A McMillen, Todd M Scheske
  • Publication number: 20130278909
    Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
    Type: Application
    Filed: May 20, 2013
    Publication date: October 24, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: MARK A. HACKLER, ANANDKUMAR R. KANNURPATTI, ROBERT A. MCMILLEN, TODD M. SCHESKE
  • Patent number: 8468941
    Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: June 25, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Mark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Todd M. Scheske
  • Patent number: 8464637
    Abstract: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: June 18, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Mark A. Hackler, David Anthony Belfiore, Dietmar Dudek, Anandkumar R. Kannurpatti, Andreas Koch
  • Patent number: 8349185
    Abstract: The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: January 8, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Mark A. Hackler, Rajgopal Subramanian
  • Publication number: 20120100489
    Abstract: The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.
    Type: Application
    Filed: October 20, 2010
    Publication date: April 26, 2012
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: MARK A. HACKLER, RAJGOPAL SUBRAMANIAN
  • Publication number: 20100242761
    Abstract: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.
    Type: Application
    Filed: May 24, 2010
    Publication date: September 30, 2010
    Applicant: E.I. DU PONT NEMOURS AND COMPANY
    Inventors: Mark A. Hackler, David Anthony Belfiore, Dietmar Dudek, Anandkumar R. Kannurpatti, Andreas Koch
  • Publication number: 20100062230
    Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.
    Type: Application
    Filed: November 13, 2009
    Publication date: March 11, 2010
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: MARK A. HACKLER, ANANDKUMAR R. KANNURPATTI, ROBERT A. MCMILLEN, TODD M. SCHESKE
  • Patent number: 7611597
    Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: November 3, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Mark A Hackler, Dietmar Dudek, William W. Early, Anandkumar R. Kannurpatti, Jeffrey Robert Lake, Robert A. McMillen, David B. Neufeglise, Pier Luigi Sassanelli
  • Publication number: 20090098491
    Abstract: This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.
    Type: Application
    Filed: December 16, 2008
    Publication date: April 16, 2009
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Mark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Wilford Shamlin, Arthur J. Taggi, Jeffrey Robert Lake, David B. Neufeglise, Siegfried R. Scheske
  • Patent number: 7503258
    Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.
    Type: Grant
    Filed: July 28, 2005
    Date of Patent: March 17, 2009
    Assignee: E. I. Du Pont de Nemours & Company
    Inventors: Robert A. McMillen, Dietmar Dudek, Mark A. Hackler, Anandkumar R. Kannurpatti, John W. Trainor, Jr.
  • Patent number: 7491003
    Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element. The photosensitive element includes a composition layer capable of being partially liquefied upon heating. Heating the layer causes one or more organic compounds in the layer to form a vapor. Oxidation of the vapor forms carbon dioxide and water vapor and reduces the need to manage waste streams containing the organic compounds.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: February 17, 2009
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Mark A. Hackler, James J. Grant, III, Bernard F. Hoff, Carmo Joseph Pereira, Wilford Shamlin, Thomas A. Simpson
  • Publication number: 20080213706
    Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.
    Type: Application
    Filed: March 20, 2008
    Publication date: September 4, 2008
    Inventors: Mark A. Hackler, Dietmar Dudek, William W. Early, Anandkumar R. Kannurpatti, Jeffrey Robert Lake, Robert A. McMillen, David B. Neufeglise, Pier Luigi Sassanelli