Patents by Inventor Mark A. Hackler
Mark A. Hackler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250313695Abstract: The invention pertains to a printing form precursor, and particularly a printing form precursor that can form printing forms, or printing plates, having improved properties. The printing form precursor includes a photopolymerizable composition containing an additive having a structure of Formula (I). The presence of the additive results in ease of processing and/or better cleanout and reduction in webmarkings on solid areas of the printing form.Type: ApplicationFiled: July 26, 2022Publication date: October 9, 2025Inventors: Adrian Lungu, Violeta Lungu, Mark A. Hackler
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Publication number: 20200254749Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: April 24, 2020Publication date: August 13, 2020Inventors: Robert M. Blomquist, Bradley K. Taylor, John Stephen Locke, Mark A. Hackler
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Publication number: 20130278909Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: ApplicationFiled: May 20, 2013Publication date: October 24, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: MARK A. HACKLER, ANANDKUMAR R. KANNURPATTI, ROBERT A. MCMILLEN, TODD M. SCHESKE
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Patent number: 8468941Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: GrantFiled: November 13, 2009Date of Patent: June 25, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Todd M. Scheske
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Patent number: 8464637Abstract: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.Type: GrantFiled: May 24, 2010Date of Patent: June 18, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A. Hackler, David Anthony Belfiore, Dietmar Dudek, Anandkumar R. Kannurpatti, Andreas Koch
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Patent number: 8349185Abstract: The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.Type: GrantFiled: October 20, 2010Date of Patent: January 8, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A. Hackler, Rajgopal Subramanian
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Publication number: 20120100489Abstract: The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.Type: ApplicationFiled: October 20, 2010Publication date: April 26, 2012Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: MARK A. HACKLER, RAJGOPAL SUBRAMANIAN
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Publication number: 20100242761Abstract: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.Type: ApplicationFiled: May 24, 2010Publication date: September 30, 2010Applicant: E.I. DU PONT NEMOURS AND COMPANYInventors: Mark A. Hackler, David Anthony Belfiore, Dietmar Dudek, Anandkumar R. Kannurpatti, Andreas Koch
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Publication number: 20100062230Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: ApplicationFiled: November 13, 2009Publication date: March 11, 2010Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: MARK A. HACKLER, ANANDKUMAR R. KANNURPATTI, ROBERT A. MCMILLEN, TODD M. SCHESKE
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Publication number: 20090098491Abstract: This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.Type: ApplicationFiled: December 16, 2008Publication date: April 16, 2009Applicant: E. I. DU PONT DE NEMOURS AND COMPANYInventors: Mark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Wilford Shamlin, Arthur J. Taggi, Jeffrey Robert Lake, David B. Neufeglise, Siegfried R. Scheske
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Patent number: 7503258Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.Type: GrantFiled: July 28, 2005Date of Patent: March 17, 2009Assignee: E. I. Du Pont de Nemours & CompanyInventors: Robert A. McMillen, Dietmar Dudek, Mark A. Hackler, Anandkumar R. Kannurpatti, John W. Trainor, Jr.
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Patent number: 7491003Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element. The photosensitive element includes a composition layer capable of being partially liquefied upon heating. Heating the layer causes one or more organic compounds in the layer to form a vapor. Oxidation of the vapor forms carbon dioxide and water vapor and reduces the need to manage waste streams containing the organic compounds.Type: GrantFiled: April 24, 2006Date of Patent: February 17, 2009Assignee: E.I. du Pont de Nemours and CompanyInventors: Mark A. Hackler, James J. Grant, III, Bernard F. Hoff, Carmo Joseph Pereira, Wilford Shamlin, Thomas A. Simpson
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Publication number: 20080213706Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.Type: ApplicationFiled: March 20, 2008Publication date: September 4, 2008Inventors: Mark A. Hackler, Dietmar Dudek, William W. Early, Anandkumar R. Kannurpatti, Jeffrey Robert Lake, Robert A. McMillen, David B. Neufeglise, Pier Luigi Sassanelli
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Patent number: 7398812Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.Type: GrantFiled: December 10, 2004Date of Patent: July 15, 2008Assignee: E.I. du Pont de Nemours and CompanyInventors: Mark A. Hackler, Dietmar Dudek, William W. Early, Anandkumar R. Kannurpatti, Jeffrey Robert Lake, Robert A. McMillen, David B. Neufeglise, Pier Luigi Sassanelli
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Patent number: 7358026Abstract: This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material.Type: GrantFiled: September 15, 2005Date of Patent: April 15, 2008Assignee: E. I. du Pont de Nemours and CompanyInventors: Dietmar Dudek, Mark A. Hackler, Robert A. McMillen, Allan Banke
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Patent number: 7122295Abstract: A flexographic printing plate is prepared from a photosensitive element having a photopolymerizable elastomeric layer with specific rheological properties. The element is imagewise exposed and thermally treated to form a relief structure suitable for flexographic printing.Type: GrantFiled: April 18, 2001Date of Patent: October 17, 2006Assignee: E. I. du Pont de Nemours and CompanyInventors: Christoph Mengel, Dietmar Dudek, Mark A. Hackler, Anandkumar Ramakrishnan Kannurpatti
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Patent number: 6797454Abstract: A method and apparatus for thermal processing a photosensitive element includes heating a composition layer on a flexible substrate to a melt temperature of an unirradiated area of the composition layer and maintaining the flexible substrate at a temperature below the melt temperature while pressing a heated absorbent layer against the heated composition layer, and repeating these steps for multiple cycles. A further embodiment of the method includes a step of cooling the flexible substrate and layer laminate on each cycle to maintain the flexible substrate at the desired temperature below that of the heated composition layer.Type: GrantFiled: February 19, 2002Date of Patent: September 28, 2004Assignee: E. I. du Pont de Nemours and CompanyInventors: Melvin Harry Johnson, David Anthony Belfiore, Mark A. Hackler, Anandkumar Ramakrishnan Kannurpatti, Robert Lee Brown, Stephen Cushner, Robert Finley Drury
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Process for making a flexographic printing plate and a photosensitive element for use in the process
Patent number: 6773859Abstract: The invention relates to a process for preparing a flexographic printing plate from a photosensitive element having a photopolymerizable layer and a thermally removable layer on the photopolymerizable layer. The process includes imagewise exposing the photosensitive element and thermally treating the exposed element to form a relief suitable for use in flexographic printing. The thermally removable layer can be transparent or opaque to actinic radiation. The invention also relates to a photosensitive element for use in this process. The photosensitive element includes a photopolymerizable layer and at least one thermally removable layer having a filler and a binder, wherein the binder is less than 49% by weight, based on the total weight of the binder and filler.Type: GrantFiled: February 27, 2002Date of Patent: August 10, 2004Assignee: E. I. du Pont de Nemours and CompanyInventors: Roxy Ni Fan, Mark A. Hackler, Anandkumar R. Kannurpatti, Adrian Lungu, Bradley K. Taylor -
Publication number: 20030211423Abstract: A flexographic printing plate is prepared from a photosensitive element having a photopolymerizable elastomeric layer with specific rheological properties. The element is imagewise exposed and thermally treated to form a relief structure suitable for flexographic printing.Type: ApplicationFiled: October 18, 2002Publication date: November 13, 2003Inventors: Christoph Mengel, Dietmar Dudek, Mark A. Hackler, Anandkumar Ramakrishnan Kannurpatti
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Process for making a flexographic printing plate and a photosensitive element for use in the process
Publication number: 20030180655Abstract: The invention relates to a process for preparing a flexographic printing plate from a photosensitive element having a photopolymerizable layer and a thermally removable layer on the photopolymerizable layer. The process includes imagewise exposing the photosensitive element and thermally treating the exposed element to form a relief suitable for use in flexographic printing. The thermally removable layer can be transparent or opaque to actinic radiation. The invention also relates to a photosensitive element for use in this process. The photosensitive element includes a photopolymerizable layer and at least one thermally removable layer having a filler and a binder, wherein the binder is less than 49% by weight, based on the total weight of the binder and filler.Type: ApplicationFiled: February 27, 2002Publication date: September 25, 2003Inventors: Roxy Ni Fan, Mark A. Hackler, Anandkumar R. Kannurpatti, Adrian Lungu, Bradley K. Taylor