Patents by Inventor Mark A. Hackler
Mark A. Hackler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11858252Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: September 7, 2022Date of Patent: January 2, 2024Assignee: DUPONT ELECTRONICS, INC.Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Publication number: 20230311473Abstract: The invention pertains to a printing form precursor, and particularly a printing form precursor that can form printing forms, or printing plates, having improved properties. The printing form precursor includes a photopolymerizable composition containing an additive having a structure of Formula (I). The presence of the additive results in ease of processing and/or better cleanout and reduction in webmarkings on solid areas of the printing form.Type: ApplicationFiled: March 21, 2023Publication date: October 5, 2023Inventors: Adrian Lungu, VIOLETA LUNGU, MARK A HACKLER
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Publication number: 20230001684Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: September 7, 2022Publication date: January 5, 2023Inventors: Robert M Blomquist, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
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Patent number: 11465402Abstract: A photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and a process of making the photosensitive element are disclosed. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: April 24, 2020Date of Patent: October 11, 2022Assignee: DUPONT ELECTRONICS, INC.Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Publication number: 20200254749Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: April 24, 2020Publication date: August 13, 2020Inventors: Robert M. Blomquist, Bradley K. Taylor, John Stephen Locke, Mark A. Hackler
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Patent number: 10668711Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: May 26, 2016Date of Patent: June 2, 2020Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Publication number: 20160355004Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: May 26, 2016Publication date: December 8, 2016Inventors: ROBERT M BLOMQUIST, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
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Patent number: 8573120Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: GrantFiled: May 20, 2013Date of Patent: November 5, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A Hackler, Anandkumar R Kannurpatti, Robert A McMillen, Todd M Scheske
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Publication number: 20130278909Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: ApplicationFiled: May 20, 2013Publication date: October 24, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: MARK A. HACKLER, ANANDKUMAR R. KANNURPATTI, ROBERT A. MCMILLEN, TODD M. SCHESKE
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Patent number: 8468941Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: GrantFiled: November 13, 2009Date of Patent: June 25, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Todd M. Scheske
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Patent number: 8464637Abstract: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.Type: GrantFiled: May 24, 2010Date of Patent: June 18, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A. Hackler, David Anthony Belfiore, Dietmar Dudek, Anandkumar R. Kannurpatti, Andreas Koch
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Patent number: 8349185Abstract: The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.Type: GrantFiled: October 20, 2010Date of Patent: January 8, 2013Assignee: E I du Pont de Nemours and CompanyInventors: Mark A. Hackler, Rajgopal Subramanian
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Publication number: 20120100489Abstract: The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.Type: ApplicationFiled: October 20, 2010Publication date: April 26, 2012Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: MARK A. HACKLER, RAJGOPAL SUBRAMANIAN
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Publication number: 20100242761Abstract: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns.Type: ApplicationFiled: May 24, 2010Publication date: September 30, 2010Applicant: E.I. DU PONT NEMOURS AND COMPANYInventors: Mark A. Hackler, David Anthony Belfiore, Dietmar Dudek, Anandkumar R. Kannurpatti, Andreas Koch
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Publication number: 20100062230Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt; supporting a development medium with a non-rotating surface to provide contact of the development medium with the heated photosensitive element; and providing relative movement between the development medium and the non-rotating surface.Type: ApplicationFiled: November 13, 2009Publication date: March 11, 2010Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: MARK A. HACKLER, ANANDKUMAR R. KANNURPATTI, ROBERT A. MCMILLEN, TODD M. SCHESKE
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Patent number: 7611597Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.Type: GrantFiled: March 20, 2008Date of Patent: November 3, 2009Assignee: E. I. du Pont de Nemours and CompanyInventors: Mark A Hackler, Dietmar Dudek, William W. Early, Anandkumar R. Kannurpatti, Jeffrey Robert Lake, Robert A. McMillen, David B. Neufeglise, Pier Luigi Sassanelli
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Publication number: 20090098491Abstract: This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.Type: ApplicationFiled: December 16, 2008Publication date: April 16, 2009Applicant: E. I. DU PONT DE NEMOURS AND COMPANYInventors: Mark A. Hackler, Anandkumar R. Kannurpatti, Robert A. McMillen, Wilford Shamlin, Arthur J. Taggi, Jeffrey Robert Lake, David B. Neufeglise, Siegfried R. Scheske
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Patent number: 7503258Abstract: This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.Type: GrantFiled: July 28, 2005Date of Patent: March 17, 2009Assignee: E. I. Du Pont de Nemours & CompanyInventors: Robert A. McMillen, Dietmar Dudek, Mark A. Hackler, Anandkumar R. Kannurpatti, John W. Trainor, Jr.
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Patent number: 7491003Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element. The photosensitive element includes a composition layer capable of being partially liquefied upon heating. Heating the layer causes one or more organic compounds in the layer to form a vapor. Oxidation of the vapor forms carbon dioxide and water vapor and reduces the need to manage waste streams containing the organic compounds.Type: GrantFiled: April 24, 2006Date of Patent: February 17, 2009Assignee: E.I. du Pont de Nemours and CompanyInventors: Mark A. Hackler, James J. Grant, III, Bernard F. Hoff, Carmo Joseph Pereira, Wilford Shamlin, Thomas A. Simpson
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Publication number: 20080213706Abstract: This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment.Type: ApplicationFiled: March 20, 2008Publication date: September 4, 2008Inventors: Mark A. Hackler, Dietmar Dudek, William W. Early, Anandkumar R. Kannurpatti, Jeffrey Robert Lake, Robert A. McMillen, David B. Neufeglise, Pier Luigi Sassanelli