Patents by Inventor Mark A. Leclerc

Mark A. Leclerc has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Period reconfiguration and closed loop calibration of an interference lithography patterning system and method of operation
    Patent number: 6556280
    Abstract: A lithographic tool system for generating an interferometric pattern of light using a plurality of exposure beams includes a processor coupled to a positioning device. The processor receives a selected period for the interferometric pattern of light, and generates an angular control signal and a translational control signal in response to the selected period. The positioning device translates an exposure beam in response to the translational control signal, and rotates the exposure beam in response to the angular control signal.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: April 29, 2003
    Assignee: Optical Switch Corporation
    Inventors: Adam F. Kelsey, Mark A. Leclerc
  • Interference lithography using holey fibers
    Patent number: 6522433
    Abstract: A method and apparatus for interference lithography utilize a fiber having a cladding region with axially formed holes surrounding a core region. The fiber emits an optical signal to perform interference lithography. A number of alternative variations in the size and arrangement of axially formed holes produces fibers having characteristics particularly adapted for receiving, communicating, and emitting optical signals for interference lithography.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: February 18, 2003
    Assignee: Optical Switch Corporation
    Inventors: Adam F. Kelsey, Mark A. Leclerc, Daniel P. Resler
  • Interference lithography using holey fibers
    Publication number: 20020149849
    Abstract: A method and apparatus for interference lithography utilize a fiber having a cladding region with axially formed holes surrounding a core region. The fiber emits an optical signal to perform interference lithography. A number of alternative variations in the size and arrangement of axially formed holes produces fibers having characteristics particularly adapted for receiving, communicating, and emitting optical signals for interference lithography.
    Type: Application
    Filed: April 4, 2001
    Publication date: October 17, 2002
    Applicant: Optical Switch Corporation
    Inventors: Adam F. Kelsey, Mark A. Leclerc, Daniel P. Resler
  • Polarization vector alignment for interference lithography patterning
    Publication number: 20020149757
    Abstract: A polarization vector alignment technique for interference lithography generates a control signal indicating a difference in orientation between a polarization state of an emitted optical signal and a desired linear polarization vector. The technique adjusts the linear polarization vector to enhance the quality of the pattern produced for interference lithography.
    Type: Application
    Filed: April 4, 2001
    Publication date: October 17, 2002
    Applicant: Optical Switch Corporation
    Inventors: Adam F. Kelsey, Mark A. Leclerc, Bruce D. MacLeod