Abstract: Manufacturing a detector device such as a microchannel plate (MCP) includes using a first atomic layer deposition (ALD) process with first precursor materials to deposit a resistive layer on a substrate and thereby form a resistive-coated substrate, the first precursor materials including a conductive rhenium material and an insulative aluminum material. The resistive layer is deposited as interspersed conductive and insulative regions of a rhenium constituent and an aluminum constituent respectively in a predetermined ratio. A second ALD process with second precursor materials is used to deposit an emissive layer on the resistive-coated substrate, the emissive layer being constituted to generate electrical carriers in use of the detector device to be sensed by external sensing circuitry as detected events. The first ALD process is performed at a deposition temperature sufficiently above 200° C. to obtain a dark-current contribution of the resistive layer of less than about 600 Hz/cm2.

Abstract: A functionalized glass device, such as a microchannel plate, includes a glass substrate having a chemistry including an ionic species that may diffuse toward a surface, and a functional layer supported by the glass substrate and having a functional characteristic that may be undesirably altered by introduction of the ionic species during operation of the device. An ion barrier layer is disposed between the surface of the glass substrate and the functional layer, the ion barrier layer being substantially of a metal oxide material effective to limit the diffusion of the ionic species into the functional layer.

Abstract: A method of making a functionalized device for amplification or multiplication of electrons includes making a glass channel array by a laser-induced deep etching process including (1) applying laser pulses to a glass substrate to form an array of modified areas, the glass substrate having a thickness less than 5 mm, the modified areas extending between two surfaces of the glass substrate, and (2) subsequently performing an etching process to selectively remove the modified areas and thereby form an array of through channels. Subsequently, one or more materials are deposited on the glass channel array to form the functionalized device.