Abstract: A charge-balanced, continuous-write mask and wafer process changes the magneto resistive photo-definition step to a two-mask step operation. Critical images are written on one mask layer at a very small electron beam spot size, and non-critical images are written on a second mask layer at a relatively larger electron beam spot size. Both mask layers are put onto the same glass substrate where the critical mask layer is located at the most accurate position on the substrate. The non-critical images may be placed in a peripheral field. In wafer processing, the critical field is aligned and exposed onto the wafer and then the non-critical field is aligned and exposed.

Abstract: A method makes a magnetic head having a top and a bottom, front and rear ends and an air bearing surface (ABS) at the front end, comprising the steps of forming first and second pole piece layers with the first and second pole piece layers separated by a write gap layer at the ABS and connected at a back gap that is recessed rearwardly in the head from the ABS; forming a zero throat height (ZTH) defining layer of baked photoresist that is sandwiched between the first and second pole piece layers with the ZTH defining layer having a rounded front edge where the first and second pole piece layers first separate from one another after the ABS to define the ZTH; and forming an insulation stack with a coil layer embedded therein between the first and second pole piece layers with the insulation stack placed so that the ZTH defining layer is located entirely between the ABS and the coil layer.

Abstract: A method and apparatus for controlling the amount of row distortion before and dynamically during the lapping process used to manufacture sliders for magnetic storage devices. A wafer quadrant of slider rows is bonded to an extender tool held in a carrier assembly and an actuator is used to laterally apply force to the extender tool such that it changes the profile of the wafer quadrant, and thus the foremost slider row. Multiple arms may be defined in the extender tool, permitting independent engagement with and application of the lateral force by the actuator. Bending moments in each arm are then efficiently and controllably transferred into a beam in the extender tool which is proximate to the point where the wafer quadrant is bonded.

Abstract: A method and apparatus for controlling the amount of row distortion before and dynamically during the lapping process used to manufacture sliders for magnetic storage devices. A wafer quadrant of slider rows is bonded to an extender tool held in a carrier assembly and an actuator is used to laterally apply force to the extender tool such that it changes the profile of the wafer quadrant, and thus the foremost slider row. Multiple arms may be defined in the extender tool, permitting independent engagement with and application of the lateral force by the actuator. Bending moments in each arm are then efficiently and controllably transferred into a beam in the extender tool which is proximate to the point where the wafer quadrant is bonded.

Abstract: A strip of baked photoresist is employed for defining the zero throat height (ZTH) of a write head portion of a merged head. The zero throat height is the location where first and second pole pieces of the write head first commence to separate after an air bearing surface (ABS) of the write head for reducing flux leakage therebetween. A read head portion of the merged head includes a read sensor that has a recessed edge. The recessed edge defines a stripe height of the read head. The stripe height, which is the distance between the ABS and the recessed edge, establishes the magnetics of the read head. The present invention more accurately positions the ZTH with improved predictability relative to the stripe height since there is minimal shrinkage of the photoresist strip during a baking step. Further the photoresist strip has a desirable apex angle at its front ZTH defining edge for minimizing flux leakage between the pole pieces.

Abstract: An apparatus, method, and article of manufacture to separate a slider from a slider row in which it was manufactured. The apparatus comprises an articulating robot including a stage which may be moved in X-Y coordinate directions and an articulating arm that may be used to place rows of sliders on the stage. The articulating arm incorporates a rotating effectuator unit mounted at the end of the arm, the effectuator being used to pick up individual slider rows, the tray in which they sit when first introduced to the robot, or any other item that needs to be positioned during the alignment of the rows. The apparatus includes sensors and a processing unit that may be used to detect and determine dimensional characteristics of an ABS surface of a slider integral to the row. The apparatus may also include a parting device for separating the slider from the row. In performing the method, a slider row is positioned on the stage in a manner that allows the ABS surface of a slider to be sensed by the sensors.