Abstract: A method is disclosed for tuning parameter values in a recording channel of a data storage device. The parameter values are tuned using a genetic process based on the principles of simulated evolution. An initial population of individuals is generated wherein each individual includes a value for each of a plurality of channel parameters. Fitness values are then calculated for each of the individuals. Individuals are then chosen for mating from the initial population based on the calculated fitness values. The chosen individuals are manipulated using genetic operators to produce a new population of parameter strings. Fitness values are then calculated for the new population and the cycle is repeated. The process is continued until a desired fitness is achieved or a predetermined number of generations have been produced. After the process has ended, an individual is chosen based on fitness values and the channel parameters of the data storage system are set accordingly.

Abstract: A method of quality control for targets intended for use in the sputtering process. A test parameter is established by immersing the target in a tank of liquid, irradiating the target with ultrasonic energy in the Rayleigh frequency range, and integrating the portion of the ultrasonic energy which passes through the target and reflects off the back wall. This test parameter is closely related to the uniformity of a film which may be sputtered from the target onto a substrate.

Abstract: Dual phase sputter targets consisting essentially of TiN and Al, methods of manufacture thereof, and cathodic sputtering methods using such targets are disclosed. The targets are prepared by blending TiN and Al powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape. The targets are used in cathodic sputtering processes to form opaque, dark colored decorative and wear resistant coatings.