Patents by Inventor Mark Bennahmias

Mark Bennahmias has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9920447
    Abstract: A graphene composite coating on a metal surface with excellent corrosion resistance by electrophoretic or electrolytic deposition has been obtained. The composite coating was shown to significantly increase the resistance of the metal surface to electrochemical degradation. The graphene coating significantly reduces cathodic current, which is an indicator of the rate of corrosion at the interface between the cathodic material and the anodic material.
    Type: Grant
    Filed: August 20, 2015
    Date of Patent: March 20, 2018
    Assignee: LUMINIT LLC
    Inventors: Russell Kurtz, Mark Bennahmias
  • Patent number: 9658438
    Abstract: A compound polyhedral concentrator (CPOC) lens is disclosed with one smooth curved surface facing the sun and an inner surface comprised of a 3D pattern of interpenetrating minimum deviation prisms with a common origin facing the absorber. This new type of stationary solar concentrator is used to extend the acceptance angles by minimizing blocking and tip optical losses that are common with radial Fresnel design forms. Moreover, when considering the extended time period for non-tracking of the sun's movement commensurate with the increased acceptance angles the total energy collected using a combination of a CPOC lens and a photovoltaic device will be greater than the total energy collected using the photovoltaic device by itself.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: May 23, 2017
    Assignee: LITRICITY, LLC.
    Inventors: Thomas C. Forrester, Mark Bennahmias, Robert S. Block, Paul Sidlo, Rudolf A. Wiedemann
  • Publication number: 20160053398
    Abstract: A graphene composite coating on a metal surface with excellent corrosion resistance by electrophoretic or electrolytic deposition has been obtained. The composite coating was shown to significantly increase the resistance of the metal surface to electrochemical degradation. The graphene coating significantly reduces cathodic current, which is an indicator of the rate of corrosion at the interface between the cathodic material and the anodic material.
    Type: Application
    Filed: August 20, 2015
    Publication date: February 25, 2016
    Inventors: Russell Kurtz, Mark Bennahmias
  • Publication number: 20150370055
    Abstract: A compound polyhedral concentrator (CPOC) lens is disclosed with one smooth curved surface facing the sun and an inner surface comprised of a 3D pattern of interpenetrating minimum deviation prisms with a common origin facing the absorber. This new type of stationary solar concentrator is used to extend the acceptance angles by minimizing blocking and tip optical losses that are common with radial Fresnel design forms. Moreover, when considering the extended time period for non-tracking of the sun's movement commensurate with the increased acceptance angles the total energy collected using a combination of a CPOC lens and a photovoltaic device will be greater than the total energy collected using the photovoltaic device by itself.
    Type: Application
    Filed: February 12, 2014
    Publication date: December 24, 2015
    Applicant: LITRICITY, LLC
    Inventors: Thomas C. FORRESTER, Rudolf A. WIEDEMANN, Mark BENNAHMIAS, Robert S. BLOCK, Paul SIDLO
  • Publication number: 20150029749
    Abstract: A backlight apparatus comprised of a light pipe with one or more light input ends, a top surface, a bottom surface, opposing side, a non imaging optic collimator and scatter inducing elements. The non imaging optic collimator causes the light rays entering into the light pipe to be directed towards the far end relative to the light input end in a specified angular distribution. Pluralities of scatter induced elements (SIE) are introduced in the body of the light pipe between the applicable light input end and the corresponding far end. Individual scatter induced elements may be formed in any geometry, and may be grouped or separated such that there exists a variation of SIE each individually or as grouped, possessing discrete geometries.
    Type: Application
    Filed: July 24, 2013
    Publication date: January 29, 2015
    Inventors: JEFFREY Alan LAINE, Mark Bennahmias
  • Patent number: 8278027
    Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: October 2, 2012
    Assignee: Nexgen Semi Holding, Inc.
    Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
  • Publication number: 20120028464
    Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
    Type: Application
    Filed: July 21, 2011
    Publication date: February 2, 2012
    Applicant: NEXGEN SEMI HOLDING, INC.
    Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
  • Patent number: 7993813
    Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: August 9, 2011
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
  • Publication number: 20080160431
    Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
    Type: Application
    Filed: November 21, 2007
    Publication date: July 3, 2008
    Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
  • Patent number: 7336299
    Abstract: A panoramic annular lens system (PAL), a unitary video camera and a PC-based software system that unwraps a 360° video image into a seamless, distortion free horizontal image image in real time. The PAL system of the preferred embodiment has a 360° horizontal field of view and a 90° vertical field of view in a 40 mm diameter compact package. The invention is not limited to any particular type of lens system. In fact, there are numerous lens systems for providing a 360° panoramic view. The video camera may be a CCD or CMOS based device having a pixel resolution of either 1280×1024 (high resolution) or 720×480 (NTSC). The unwrapping system is a radiometric ray tracing program carried out using a computer's graphics card capabilities to produce highly efficient regional transformation while minimizing software overhead. The result is real time, high resolution 30 fps conversion from a spherical distorted image to a flat panoramic image in Cartesian coordinates.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: February 26, 2008
    Assignee: Physical Optics Corporation
    Inventors: Andrew A Kostrzewski, Sookwang Ro, Il'ya Agurok, Mark Bennahmias
  • Publication number: 20070284695
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 13, 2007
    Applicant: NexGenSemi Holdings Corporation
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070284538
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 13, 2007
    Applicant: NexGenSemi Holdings Corporation
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070284537
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 13, 2007
    Applicant: NexGenSemi Holdings Corporation
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070284527
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 17, 2007
    Publication date: December 13, 2007
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070278428
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 6, 2007
    Applicant: NexGenSemi Holdings Corporation
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070278419
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 6, 2007
    Applicant: NexGenSemi Holdings Corporation
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070278418
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: August 20, 2007
    Publication date: December 6, 2007
    Applicant: NexGenSemi Holdings Corporation
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20070045534
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: July 10, 2006
    Publication date: March 1, 2007
    Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
  • Publication number: 20060023105
    Abstract: A panoramic annular lens system (PAL), a unitary video camera and a PC-based software system that unwraps a 360° video image into a seamless, distortion free horizontal image image in real time. The PAL system of the preferred embodiment has a 360° horizontal field of view and a 90° vertical field of view in a 40 mm diameter compact package. The invention is not limited to any particular type of lens system. In fact, there are numerous lens systems for providing a 360° panoramic view. The video camera may be a CCD or CMOS based device having a pixel resolution of either 1280×1024 (high resolution) or 720×480 (NTSC). The unwrapping system is a radiometric ray tracing program carried out using a computer's graphics card capabilities to produce highly efficient regional transformation while minimizing software overhead. The result is real time, high resolution 30 fps conversion from a spherical distorted image to a flat panoramic image in Cartesian coordinates.
    Type: Application
    Filed: January 15, 2004
    Publication date: February 2, 2006
    Inventors: Andrew Kostrzewski, Sookwang Ro, Il'ya Agurok, Mark Bennahmias
  • Patent number: 6733147
    Abstract: An LED-based backlighting system that provides excellent brightness and homogeneity suitable for high performance multi-color and high resolution portable displays such as for PDAs and cell phones. Several different but similar embodiments are disclosed. Some are suitable for use with multiple LEDs and some for use with a single LED. In a first such embodiment, multiple LEDs are located adjacent the input edge of a light pipe. The input edge contains fixed pitch grooves to propagate the LED light in a direction that is substantially angled toward the bottom surface of the light pipe along its entire area. The light pipe bottom surface also has grooves for altering the direction of the LED light toward the upper surface of the light pipe where it exits the light pipe toward a viewer. The exterior of the exit surface of the light pipe receives a light shaping diffuser (LSD) and an optical film.
    Type: Grant
    Filed: July 27, 2002
    Date of Patent: May 11, 2004
    Inventors: San Zhuang Wang, Gajendra Savant, Jeffrey A. Laine, Mark Bennahmias, Rick L. Shie