Patents by Inventor Mark Biedrzycki

Mark Biedrzycki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230197403
    Abstract: Methods and apparatus are disclosed for integration of image-based metrology into a milling workflow. A first ion beam milling operation is performed to an edge at a distance from a final target position on a sample. An SEM image of the sample is used to determine a distance between the milled edge and a reference structure on the sample. Based on the determined distance, the ion beam is adjusted to perform a second milling operation to shift the milled edge to the final target position. Extensions to iterative procedures are disclosed. Various geometric configurations and corrections are disclosed. Manufacturing and analytic applications are disclosed in a variety of fields, including read-write head manufacture and TEM sample preparation. Other combinations of imaging and milling tools can be used.
    Type: Application
    Filed: July 26, 2022
    Publication date: June 22, 2023
    Applicant: FEI Company
    Inventors: Thomas Gary Miller, Jason Arjavac, Brian Routh, JR., Mark Biedrzycki
  • Publication number: 20230177715
    Abstract: Fiducial coordinates are obtained by aligning template with region of interest extracted from a workpiece image. Image values in the region of interest are projected along a template axis and the project values evaluated to establish a fiducial location which can be used as a reference location for locating workpiece areas for ion beam milling or other processing.
    Type: Application
    Filed: December 3, 2021
    Publication date: June 8, 2023
    Applicant: FEI Company
    Inventors: Umesh Adiga, Mark Biedrzycki