Patents by Inventor Mark Burton Holbrook

Mark Burton Holbrook has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process monitor
    Patent number: 6894786
    Abstract: A substrate is etched in a vacuum enclosure in a process which generates plasma light emission. The process is monitored by passing emitted light via a window, a thin film narrow band filter and a “Fabry-Perot” etalon to a detector. The output signal from the detector is analyzed by shape recognition techniques to derive a measure of the progress of the process. The shape recognition preferably makes use of digital filtering and comparison with reference data derived from the theoretical analysis or from a calibration run.
    Type: Grant
    Filed: July 12, 1999
    Date of Patent: May 17, 2005
    Assignee: Vorgem Limited
    Inventors: Mark Burton Holbrook, William George Beckmann, Jacques Andre Grange
  • Thickness monitoring
    Patent number: 6226086
    Abstract: The thickness of a thin layer structure is monitored during deposition or etching. The structure is illuminated with a predetermined energy (visible or near visible light or x-ray) and a modified parameter of the illumination is measured, which may be reflection intensity, transmission intensity or polarisation. The detected signal is examined by shape recognition techniques using adaptive digital filters.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: May 1, 2001
    Assignee: Vorgem Limited
    Inventors: Mark Burton Holbrook, William George Beckmann, Simon Eric Hicks, Christopher David Wicks Wilkinson