Abstract: Methods, systems and apparatus for automatically maintaining a pressure differential for the continuous delivery of a liquid to semiconductor manufacturing equipment. A refillable bulk liquid delivery system includes a plurality of canisters residing along a liquid flow path, whereby an over pressure is detected within at least one of the canisters. The over pressure may be detected using an automatic venting circuit or a programmable logic controller programmed for detecting such over pressures. The over pressure is then exhausted by removing excess pressure from the canister through a venting valve to maintain a Delta pressure across the canisters for continuously delivering the liquid along the liquid flow path.

Abstract: Methods, systems and apparatus for automatically maintaining a pressure differential for the continuous delivery of a liquid to semiconductor manufacturing equipment. A refillable bulk liquid delivery system includes a plurality of canisters residing along a liquid flow path, whereby an over pressure is detected within at least one of the canisters. The over pressure may be detected using an automatic venting circuit or a programmable logic controller programmed for detecting such over pressures. The over pressure is then exhausted by removing excess pressure from the canister through a venting valve to maintain a Delta pressure across the canisters for continuously delivering the liquid along the liquid flow path.

Abstract: A flow monitoring system (14) for and method of monitoring the flow of processing gases in a wafer processing system (10) during the manufacturing of microelectronic devices. The wafer processing system includes a wafer processing chamber (12) in fluid communication with a gas delivery system (18) via a common conduit (32). The gas delivery system includes a plurality of gas sources (22) each having a flow regulator (24) and a flow meter (26). The flow monitoring system includes a total flow meter (36) in fluid communication with the common conduit between the gas delivery system and the processing chamber. When a gas is flowed into wafer processing chamber from one of the gas sources, the comparator compares a first flow signal from the total flow meter to a second signal from the flow meter corresponding to the active gas source to determine whether or not the corresponding flow regulator is properly calibrated.

Abstract: A flow monitoring system (14) for and method of monitoring the flow of processing gases in a wafer processing system (10) during the manufacturing of microelectronic devices. The wafer processing system includes a wafer processing chamber (12) in fluid communication with a gas delivery system (18) via a common conduit (32). The gas delivery system includes a plurality of gas sources (22) each having a flow regulator (24) and a flow meter (26). The flow monitoring system includes a total flow meter (36) in fluid communication with the common conduit between the gas delivery system and the processing chamber. When a gas is flowed into wafer processing chamber from one of the gas sources, the comparator compares a first flow signal from the total flow meter to a second signal from the flow meter corresponding to the active gas source to determine whether or not the corresponding flow regulator is properly calibrated.