Patents by Inventor Mark C. Simmons
Mark C. Simmons has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8832609Abstract: A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.Type: GrantFiled: July 22, 2013Date of Patent: September 9, 2014Assignee: Mentor Graphics CorporationInventors: Juan Andres Torres Robles, William S. Graupp, Mark C. Simmons
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Patent number: 8683394Abstract: Aspects of the invention relate to techniques for improving speed and consistency of OPC processes based on pattern matching. Pattern matching may be performed on a layout design to determine one or more arrays in the layout design that comprise arrays of identical layout patterns of which each matches a reference pattern. The one or more arrays may then be partitioned into core portions and boundary portions. The OPC process information for the reference pattern may be applied to the core portions, while a conventional OPC process may be performed on the boundary portions and layout regions outside of the one or more arrays.Type: GrantFiled: January 31, 2012Date of Patent: March 25, 2014Assignee: Mentor Graphics CorporationInventor: Mark C Simmons
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Publication number: 20130305195Abstract: A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.Type: ApplicationFiled: July 22, 2013Publication date: November 14, 2013Applicant: Mentor Graphics CorporationInventors: Juan Andres Torres Robles, William S. Graupp, Mark C. Simmons
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Patent number: 8504959Abstract: A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.Type: GrantFiled: November 7, 2011Date of Patent: August 6, 2013Assignee: Mentor Graphics CorporationInventors: Juan Andres Torres Robles, William S. Graupp, Mark C. Simmons
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Publication number: 20130198699Abstract: Aspects of the invention relate to techniques for improving speed and consistency of OPC processes based on pattern matching. Pattern matching may be performed on a layout design to determine one or more arrays in the layout design that comprise arrays of identical layout patterns of which each matches a reference pattern. The one or more arrays may then be partitioned into core portions and boundary portions. The OPC process information for the reference pattern may be applied to the core portions, while a conventional OPC process may be performed on the boundary portions and layout regions outside of the one or more arrays.Type: ApplicationFiled: January 31, 2012Publication date: August 1, 2013Inventor: Mark C Simmons
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Publication number: 20130132917Abstract: Aspects of the invention relate to techniques for generating and applying pattern matching hints. Pattern matching hints are determined for and stored with reference patterns. Once layout patterns that match a reference pattern are identified in a layout design through a pattern matching process, the corresponding pattern matching hints may be associated with the identified layout patterns. The association operation may comprise adjusting the identified layout patterns based on the corresponding pattern matching hints.Type: ApplicationFiled: November 18, 2011Publication date: May 23, 2013Inventor: Mark C. Simmons
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Patent number: 8326018Abstract: Aspects of the invention relate to pattern matching of layout design data. Layout design data is searched to identify configurations of geometric elements that match a reference pattern based on an anchor edge in the reference pattern. An edge in a search window area matching the anchor edge may first be selected as anchor matching edge. A search portion of the reference pattern is then compared with the region of the search window area corresponding to the selected anchor matching edge.Type: GrantFiled: May 29, 2010Date of Patent: December 4, 2012Assignee: Mentor Graphics CorporationInventors: Mark C Simmons, Oberdan Otto
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Publication number: 20120191729Abstract: Aspects of the invention relate to pattern matching of layout design data. Layout design data is searched to identify configurations of geometric elements that match a reference pattern based on an anchor edge in the reference pattern. An edge in a search window area matching the anchor edge may first be selected as anchor matching edge. A search portion of the reference pattern is then compared with the region of the search window area corresponding to the selected anchor matching edge.Type: ApplicationFiled: May 29, 2010Publication date: July 26, 2012Inventors: Mark C. Simmons, Oberdan Otto
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Publication number: 20120144351Abstract: A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.Type: ApplicationFiled: November 7, 2011Publication date: June 7, 2012Applicant: Mentor Graphics CorporationInventors: Juan Andres Torres Robles, William S. Graupp, Mark C. Simmons
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Patent number: 8185847Abstract: A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.Type: GrantFiled: March 18, 2009Date of Patent: May 22, 2012Assignee: Mentor Graphics CorporationInventors: Juan Andres Torres Robles, Andrew Michael Jost, Mark C. Simmons, George P. Lippincott
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Patent number: 8056022Abstract: A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.Type: GrantFiled: November 8, 2007Date of Patent: November 8, 2011Assignee: Mentor Graphics CorporationInventors: Juan Andres Torres Robles, William S. Graupp, Mark C. Simmons
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Patent number: 7739650Abstract: A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.Type: GrantFiled: February 9, 2007Date of Patent: June 15, 2010Inventors: Juan Andres Torres Robles, Andrew Michael Jost, Mark C. Simmons, George P. Lippincott
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Publication number: 20090178018Abstract: A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.Type: ApplicationFiled: March 18, 2009Publication date: July 9, 2009Inventors: Juan Andres Torres Robles, Andrew Michael Jost, Mark C. Simmons, George P. Lippincott
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Publication number: 20080195996Abstract: A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.Type: ApplicationFiled: February 9, 2007Publication date: August 14, 2008Inventors: Juan Andres Torres Robles, Andrew Michael Jost, Mark C. Simmons, George P. Lippincott
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Publication number: 20080141195Abstract: A method of preparing a set of target layout data for the application of a photolithographic friendly design (LFD) analysis or other photolithographic analysis. The target layout data is revised to remove areas or features prior to performing the LFD analysis. The features removed include features that have been determined to print correctly, duplicate features and features that are not sensitive to variations in process conditions. The revised target layout is analyzed to determine if the features that remain will print correctly on a wafer.Type: ApplicationFiled: November 8, 2007Publication date: June 12, 2008Inventors: Juan Andres Torres Robles, William S. Graupp, Mark C. Simmons
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Patent number: 7016054Abstract: The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.Type: GrantFiled: March 31, 2003Date of Patent: March 21, 2006Assignee: LSI Logic CorporationInventors: Duane B. Barber, Robert C. Muller, Mark C. Simmons
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Publication number: 20040190007Abstract: The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.Type: ApplicationFiled: March 31, 2003Publication date: September 30, 2004Inventors: Duane B. Barber, Robert C. Muller, Mark C. Simmons