Patents by Inventor Mark Chace

Mark Chace has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9740101
    Abstract: A formulation comprising an esterified polyamide resin with a photosensitive linkage, a polymerizable crosslinker, and an organic species is provided. The organic species is selected such that (a) when exposed to UV radiation, it copolymerizes with the polymerizable crosslinker and the photosensitive linkage on the esterified polyamide resin forming the crosslinking network, (b) during thermal cure the copolymer thus formed drops from polyimide backbones, and (c) wherein the thermal degradation temperature of the copolymer thus formed is lower than the thermal degradation temperature of the homopolymer formed from the polymerizable crosslinker and the thermal degradation temperature of the copolymer formed from the polymerizable crosslinker and the photosensitive linkage on the esterified polyamide resin. The formulation is useful in forming a semiconductor passivation layer and facilitates more complete removal of crosslinker using less stringent conditions.
    Type: Grant
    Filed: November 13, 2015
    Date of Patent: August 22, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Qin Yuan, Mark Chace, Jun Liu, Janine L. Protzman, Victoria L. Calero diaz del castillo
  • Publication number: 20170139324
    Abstract: A formulation comprising an esterified polyamide resin with a photosensitive linkage, a polymerizable crosslinker, and an organic species is provided. The organic species is selected such that (a) when exposed to UV radiation, it copolymerizes with the polymerizable crosslinker and the photosensitive linkage on the esterified polyamide resin forming the crosslinking network, (b) during thermal cure the copolymer thus formed drops from polyimide backbones, and (c) wherein the thermal degradation temperature of the copolymer thus formed is lower than the thermal degradation temperature of the homopolymer formed from the polymerizable crosslinker and the thermal degradation temperature of the copolymer formed from the polymerizable crosslinker and the photosensitive linkage on the esterified polyamide resin. The formulation is useful in forming a semiconductor passivation layer and facilitates more complete removal of crosslinker using less stringent conditions.
    Type: Application
    Filed: November 13, 2015
    Publication date: May 18, 2017
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Qin Yuan, Mark Chace, Jun Liu, Janine L. Protzman, Victoria L. Calero diaz del castillo
  • Publication number: 20070161521
    Abstract: Liquid compositions containing a specific hindered phenol or a hindered phenol in combination with an aromatic phosphite are provided which are used as a thermal interface between a heatsink and a chip during a test procedure for electronic components which compositions enhance the thermal conductivity between the heatsink and the chip, are easily removed from the heatsink and the chip after the test procedure without any deleterious residue and which allow the use of high temperatures for extended periods during the test procedure without any significant degradation of the composition. A method for using the compositions in electronic component test procedures such as burn-in procedures is also provided.
    Type: Application
    Filed: January 12, 2006
    Publication date: July 12, 2007
    Inventors: Krishna Sachdev, Mark Chace, Normand Cote, David Gardell, Jeffrey Gelorme, Sushumna Iruvanti, G. Lawson, Tuknekah Noble, Harbans Sachdev
  • Publication number: 20050087490
    Abstract: A process of removing impurities from a cured low dielectric constant organic polymeric film disposed on a semiconductor device. The process involves disposing a low dielectric constant curable organic polymeric film on an electrically conductive surface of a semiconductor device. The organic polymeric film is cured on the semiconductor device and thereupon contacted with supercritical carbon dioxide, optionally in the presence of at least one cosolvent.
    Type: Application
    Filed: October 28, 2003
    Publication date: April 28, 2005
    Applicant: International Business Machines Corporation
    Inventors: Mark Chace, Jeffrey Hedrick, Habib Hichri, Keith Pope, Jia Lee, Kelly Malone, Kenneth McCullough, Wayne Moreau, Darryl Restaino, Shahab Siddiqui