Patents by Inventor Mark D. Denison

Mark D. Denison has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists
    Patent number: 6107425
    Abstract: The invention provides inter alia new methods to produce aqueous developable resin binders for negative-acting photoresists. The methods in general comprise free radical polymerization of one or more types of monomers in the presence of a free radical polymerization control agent, particularly a nitroxide polymerization control agent such as a piperidinyloxy (N-oxy) free radical, and wherein at least one of the monomer types contains a moiety that enables aqueous solution development of a photoresist composition containing the formed polymer.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: August 22, 2000
    Assignee: Shipley Company, L.L.C.
    Inventors: Roger F. Sinta, George G. Barclay, Jacque H. Georger, Jr., Mark D. Denison, Sheri L. Ablaza
  • Positive acid catalyzed resists
    Patent number: 5827634
    Abstract: The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
    Type: Grant
    Filed: March 12, 1997
    Date of Patent: October 27, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
  • Polymer for positive acid catalyzed resists
    Patent number: 5763536
    Abstract: The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
    Type: Grant
    Filed: April 26, 1996
    Date of Patent: June 9, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
  • Polymer for positive acid catalyzed resists
    Patent number: 5731386
    Abstract: The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
    Type: Grant
    Filed: May 9, 1995
    Date of Patent: March 24, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
  • Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups
    Patent number: 5700624
    Abstract: The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
    Type: Grant
    Filed: May 9, 1995
    Date of Patent: December 23, 1997
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
  • Polymer having inert blocking groups
    Patent number: 5541263
    Abstract: An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
    Type: Grant
    Filed: March 16, 1995
    Date of Patent: July 30, 1996
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula, Mark D. Denison, Roger Sinta, Sheri L. Ablaza
  • Radiation sensitive composition comprising polymer having inert blocking groups
    Patent number: 5514520
    Abstract: A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
    Type: Grant
    Filed: March 16, 1995
    Date of Patent: May 7, 1996
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula, Mark D. Denison, Roger Sinta, Sheri L. Ablaza