Patents by Inventor Mark D'Evelyn
Mark D'Evelyn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8729559Abstract: A relaxed epitaxial AlxInyGa(1-x-y)N layer on a substrate having a semipolar surface orientation includes a plurality of misfit dislocations in portions of the thickness of the epitaxial layer to reduce bi-axial strain to a relaxed state.Type: GrantFiled: October 13, 2011Date of Patent: May 20, 2014Assignee: Soraa, Inc.Inventors: Mike Krames, Mark D'Evelyn, Rajeev Pakalapati, Alex Alexander, Derrick Kamber
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Publication number: 20120091465Abstract: A relaxed epitaxial AlxInyGa(1-x-y)N layer on a substrate having a semipolar surface orientation includes a plurality of misfit dislocations in portions of the thickness of the epitaxial layer to reduce bi-axial strain to a relaxed state.Type: ApplicationFiled: October 13, 2011Publication date: April 19, 2012Applicant: Soraa, Inc.Inventors: Mike Krames, Mark D'Evelyn, Rajeev Pakalapati, Alex Alexander, Derrick Kamber
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Publication number: 20120007102Abstract: A light emitting device comprising a gallium and nitrogen containing substrate. The device also has an electrically isolating material grown between the substrate and an active region such that the light emitting device is operable at a voltage greater than 10V.Type: ApplicationFiled: July 8, 2011Publication date: January 12, 2012Applicant: Soraa, Inc.Inventors: Daniel Feezell, Rajat Sharma, Arpan Chakraborty, Troy Anthony Trottier, Thomas Katona, Mark D'Evelyn
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Publication number: 20080087919Abstract: A method for growing a nitride crystal and a crystalline composition selected from one of AlN, InGaN, AlGaInN, InGaN, and AlGaNInN is provided. The composition comprises a true single crystal, grown from a single nucleus, at least 1 mm in diameter, free of lateral strain and tilt boundaries, with a dislocation density less than about 104 cm?2.Type: ApplicationFiled: October 5, 2007Publication date: April 17, 2008Inventors: Steven Tysoe, Dong-Sil Park, John Leman, Mark D'Evelyn, Kristi Narang, Huicong Hong
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Publication number: 20080008855Abstract: A crystalline composition is provided. The crystalline composition may include gallium and nitrogen; and the crystalline composition may have an infrared absorption peak at about 3175 cm?1, with an absorbance per unit thickness of greater than about 0.01 cm?1.Type: ApplicationFiled: January 9, 2007Publication date: January 10, 2008Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20080006844Abstract: A crystalline composition is provided that includes gallium and nitrogen. The crystalline composition may have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the crystalline composition. The volume may have at least one dimension that is about 2.75 millimeters or greater, and the volume may have a one-dimensional linear defect dislocation density of less than about 10,000 per square centimeter.Type: ApplicationFiled: January 9, 2007Publication date: January 10, 2008Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20070181056Abstract: A method for a growing solid-state, spectrometer grade II-VI crystal using a high-pressure hydrothermal process including the following steps: positioning seed crystals in a growth zone of a reactor chamber; positioning crystal nutrient material in the nutrient zone of the chamber; filling the reactor with a solvent fluid; heating and pressuring the chamber until at least a portion of the nutrient material dissolves in the solvent and the solvent becomes supercritical in the nutrient zone; transporting supercritical from the nutrient zone to the growth zone, and growing the seed crystals as nutrients from the supercritical fluid deposit on the crystals.Type: ApplicationFiled: April 11, 2007Publication date: August 9, 2007Applicant: GENERAL ELECTRIC COMPANYInventors: Mark D'Evelyn, Dong-Sil Park, John Leman
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Publication number: 20070178039Abstract: A method for a growing solid-state, spectrometer grade II-VI crystal using a high-pressure hydrothermal process including the following steps: positioning seed crystals in a growth zone of a reactor chamber; positioning crystal nutrient material in the nutrient zone of the chamber; filling the reactor with a solvent fluid; heating and pressuring the chamber until at least a portion of the nutrient material dissolves in the solvent and the solvent becomes supercritical in the nutrient zone; transporting supercritical from the nutrient zone to the growth zone, and growing the seed crystals as nutrients from the supercritical fluid deposit on the crystals.Type: ApplicationFiled: April 11, 2007Publication date: August 2, 2007Applicant: GENERAL ELECTRIC COMPANYInventors: Mark D'Evelyn, Dong-Sil Park, John Leman
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Publication number: 20070158785Abstract: A crystal comprising gallium nitride is disclosed. The crystal has at least one grain having at least one dimension greater than 2.75 mm, a dislocation density less than about 104 cm?2, and is substantially free of tilt boundaries.Type: ApplicationFiled: November 13, 2006Publication date: July 12, 2007Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20070151509Abstract: A composition including a polycrystalline metal nitride having a number of grains is provided. These grains have a columnar structure with one or more properties such as, an average grain size, a tilt angle, an impurity content, a porosity, a density, and an atomic fraction of the metal in the metal nitride. An apparatus for preparing a metal nitride is provided. The apparatus may include a housing having an interior surface that defines a chamber and an energy source to supply energy to the chamber. A first inlet may be provided to flow a nitrogen-containing gas into the chamber. Raw materials may be introduced into the chamber through a raw material inlet. A second inlet may be provided to flow in a halide-containing gas in the chamber. The apparatus may further include a controller, which communicates with the various components of the apparatus such as, sensors, valves, and energy source, and may optimize and control the reaction.Type: ApplicationFiled: December 20, 2005Publication date: July 5, 2007Applicant: General Electric CompanyInventors: Dong-Sil Park, Mark D'Evelyn, Myles Peterson, John Leman, Joell Hibshman, Fred Sharifi
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Publication number: 20070142204Abstract: A composition including a polycrystalline metal nitride having a number of grains is provided. These grains have a columnar structure with one or more properties such as, an average grain size, a tilt angle, an impurity content, a porosity, a density, and an atomic fraction of the metal in the metal nitride.Type: ApplicationFiled: December 20, 2005Publication date: June 21, 2007Applicant: General Electric CompanyInventors: Dong-Sil Park, Mark D'Evelyn, Myles Peterson, John Leman, Fred Sharifi
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Publication number: 20070141819Abstract: A method of making a metal nitride is provided. The method may include introducing a metal in a chamber. A nitrogen-containing material may be flowed into the chamber. Further, a hydrogen halide may be introduced. The nitrogen-containing material may react with the metal in the chamber to form the metal nitride.Type: ApplicationFiled: December 20, 2005Publication date: June 21, 2007Applicant: General Electric CompanyInventors: Dong-Sil Park, Mark D'Evelyn, Myles Peterson, John Leman, Joell Hibshman, Fred Sharifi
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Publication number: 20070040181Abstract: A crystalline composition is provided that includes gallium and nitrogen. The crystalline composition may have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the crystalline composition. The volume may have at least one dimension that is about 2.75 millimeters or greater, and the volume may have a one-dimensional linear defect dislocation density of less than about 10,000 per square centimeter.Type: ApplicationFiled: March 15, 2006Publication date: February 22, 2007Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20070000330Abstract: A pressure sensor is provided. The pressure sensor includes a multi-layer laminate comprising a substrate and a semiconductor layer, wherein the substrate comprises single crystal or quasi-single crystal aluminum oxide, and a portion of the substrate that is spaced from a peripheral edge is wet etched to form an inwardly facing sidewall that defines a volume; and a substrate to which the multi-layer laminate is secured. The volume is an enclosed volume further defined by a substrate surface.Type: ApplicationFiled: September 6, 2006Publication date: January 4, 2007Applicant: General Electric CompanyInventors: Steven Tysoe, Mark D'Evelyn, Charles Becker, Abasifreke Ebong, Stephen Arthur, Steven LeBoeuf, Robert Wojnarowski, Samhita Dasgupta, Vinayak Tilak, Kanakasabapathi Subramanian, Jeffrey Fortin
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Publication number: 20060289386Abstract: An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etching may include contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the support layer may include aluminum oxide; or contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the etchant may include Cryolite (Na3AlF6), potassium tetrafluoro borate (KBF4), or both; and etching at least a portion of the support layer. The method may provide a laminate produced by growing a crystal onto an aluminum oxide support layer, and chemically removing at least a portion of the support layer by wet etch. An electronic device, optical device or combined device including the laminate is provided.Type: ApplicationFiled: June 27, 2005Publication date: December 28, 2006Inventors: Steven Tysoe, Steven LeBoeuf, Mark D'Evelyn, Venkat Venkataramani, Vinayak Tilak, Jeffrey Fortin, Charles Becker, Stephen Arthur, Samhita Dasgupta, Kanakasabapathi Subramanian, Robert Wojnarowski, Abasifreke Ebong
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Publication number: 20060207497Abstract: A method for a growing solid-state, spectrometer grade II-VI crystal using a high-pressure hydrothermal process including the following steps: positioning seed crystals in a growth zone of a reactor chamber; positioning crystal nutrient material in the nutrient zone of the chamber; filling the reactor with a solvent fluid; heating and pressuring the chamber until at least a portion of the nutrient material dissolves in the solvent and the solvent becomes supercritical in the nutrient zone; transporting supercritical from the nutrient zone to the growth zone, and growing the seed crystals as nutrients from the supercritical fluid deposit on the crystals.Type: ApplicationFiled: March 18, 2005Publication date: September 21, 2006Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, John Leman
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Publication number: 20060177362Abstract: An apparatus and method for processing materials in supercritical fluids is disclosed. The apparatus includes a capsule configured to contain a supercritical fluid, a high strength enclosure disposed about the capsule and a sensor configured to sense pressure difference between an interior and an exterior of the capsule. The apparatus also includes a pressure control device configured to adjust pressure difference of the capsule in response to the pressure difference sensed by the sensor. The apparatus further includes at least one dividing structure disposed within the capsule that divides the capsule into a seed growing chamber and a nutrient chamber.Type: ApplicationFiled: January 25, 2005Publication date: August 10, 2006Inventors: Mark D'Evelyn, Robert Giddings, Fred Sharifi, Subhrajit Dey, Huicong Hong, Joseph Kapp, Ashok Khare
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Publication number: 20060169996Abstract: A crystalline composition is provided. The crystalline composition may include gallium and nitrogen; and the crystalline composition may have an infrared absorption peak at about 3175 cm?1, with an absorbance per unit thickness of greater than about 0.01 cm?1.Type: ApplicationFiled: March 15, 2006Publication date: August 3, 2006Applicant: General Electric CompanyInventors: Mark D'Evelyn, Dong-Sil Park, Steven LeBoeuf, Larry Rowland, Kristi Narang, Huicong Hong, Stephen Arthur, Peter Sandvik
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Publication number: 20060118799Abstract: A method may produce a resonant cavity light emitting device. A seed gallium nitride crystal and a source material in a nitrogen-containing superheated fluid may provide a medium for mass transport of gallium nitride precursors therebetween. A seed crystal surface may be prepared by applying a first thermal profile between the seed gallium nitride crystal and the source material. Gallium nitride material may be grown on the prepared surface of the seed gallium nitride crystal by applying a second thermal profile between the seed gallium nitride crystal and the source material while the seed gallium nitride crystal and the source material are in the nitrogen-containing superheated fluid. A stack of group III-nitride layers may be deposited on the single-crystal gallium nitride substrate. The stack may include a first mirror sub-stack and an active region adaptable for fabrication into one or more resonant cavity light emitting devices.Type: ApplicationFiled: December 6, 2005Publication date: June 8, 2006Applicant: General Electric CompanyInventors: Mark D'Evelyn, Xian-An Cao, Anping Zhang, Steven LeBoeuf, Huicong Hong, Dong-Sil Park, Kristi Narang
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Publication number: 20060096521Abstract: A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.Type: ApplicationFiled: December 12, 2005Publication date: May 11, 2006Inventors: Mark D'Evelyn, Thomas Anthony, Stephen Arthur, Lionel Levinson, John Lucek, Larry Rowland, Suresh Vagarali