Patents by Inventor Mark D. Heires

Mark D. Heires has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rubber modified polystyrene
    Patent number: 5491195
    Abstract: High impact polystyrene resins are provided having a surprisingly good combination of toughness and gloss characteristics. Such resins contain small (i.e., 0.1 to 0.4 micron) capsule morphology rubber particles in combination with relatively small (i.e., 0.25 to 1 micron) entanglement morphology rubber particles. It has been found that such resins are capable of providing Izod impact strength values in the range of 2.5 to 3.5 ft-lb/in (133.4 to 186.7 J/m) and higher at an overall volume average rubber size of less than 0.4 micron with corresponding gloss values in excess of 90 percent.
    Type: Grant
    Filed: December 21, 1994
    Date of Patent: February 13, 1996
    Assignee: The Dow Chemical Company
    Inventors: David Schrader, Mark E. Soderquist, Mark D. Heires
  • Rubber modified polystyrene
    Patent number: 5428106
    Abstract: High impact polystyrene resins are provided having a surprisingly good combination of toughness and gloss characteristics. Such resins contain small (i.e., 0.1 to 0.4 micron) capsule morphology rubber particles in combination with relatively small (i.e., 0.25 to 1 micron) entanglement morphology rubber particles. It has been found that such resins are capable of providing Izod impact strength values in the range of 2.5 to 3.5 ft-lb/in (133.4 to 186.7 J/m) and higher at an overall volume average rubber size of less than 0.4 micron with corresponding gloss values in excess of 90 percent.
    Type: Grant
    Filed: September 2, 1993
    Date of Patent: June 27, 1995
    Assignee: The Dow Chemical Company
    Inventors: David Schrader, Mark E. Soderquist, Mark D. Heires