Abstract: An apparatus and method for wordline voltage compensation in integrated memories is provided, where the apparatus includes an array threshold voltage (“VT”) monitor, a wordline on voltage (“Vpp”) generator in signal communication with the threshold voltage monitor for providing a wordline on voltage responsive to a change in the monitored array threshold voltage, and a wordline off voltage (“VWLL”) generator in signal communication with the threshold voltage monitor for providing a wordline off voltage responsive to a change in the monitored array threshold voltage; and where the corresponding method for compensating each of a wordline on signal and a wordline off signal in correspondence with an array threshold signal includes monitoring an array threshold signal, generating a wordline on signal responsive to the monitored array threshold signal, and generating a wordline off signal responsive to the monitored array threshold signal.

Abstract: A method of, and a circuit for, measuring a capacitor gate dielectric thickness. The method includes the step of providing a circuit including a gate dielectric capacitor, and charging the circuit with a known current. A voltage output from said circuit is measured, and this voltage is proportional to the gate dielectric capacitor thickness. The present invention may be effectively employed to obtain a number of important advantages. First, because the supply voltage scales with gate dielectric thickness, chip performance is maximized, even when gate oxide runs thick. Furthermore, oxide reliability is not affected because a constant electric field is guaranteed.

Abstract: A method of, and a circuit for, measuring a capacitor gate dielectric thickness. The method comprises the step of providing a circuit including a gate dielectric capacitor, and charging the circuit with a known current. A voltage output from said circuit is measured, and this voltage is proportional to the gate dielectric capacitor thickness. The present invention may be effectively employed to obtain a number of important advantages. First, because the supply voltage scales with gate dielectric thickness, chip performance is maximized, even when gate oxide runs thick. Furthermore, oxide reliability is not affected because a constant electric field is guaranteed.