Patents by Inventor Mark DiManna
Mark DiManna has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230402251Abstract: A gas injection subsystem for use in an inspection system serves to inspect a sample by use of charged particles. At least one gas duct of the gas injection subsystem guides a gas flow from a gas reservoir to a sample inspection region. The gas duct has in the vicinity of the sample inspection region a diameter which is less than 5 mm. At least one flow control valve of the gas injection subsystem controls the gas flow through the gas duct. The valve is switchable between an open valve state in which a nominal gas flow through the gas duct is enabled and a closed valve state in which the gas duct is closed to inhibit a gas flow through the gas duct. The valve is designed such that a switching time between the open and the closed state is 100 ms at most. A gas injection subsystem results which facilitates a reproducible gas injection to the sample inspection region.Type: ApplicationFiled: August 25, 2023Publication date: December 14, 2023Inventors: Louise Barris, Alexander Lombardi, Mark Dimanna, Jeffrey Sauer, Brett Lewis, Sybren Sijbrandij
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Patent number: 8399864Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: GrantFiled: August 31, 2011Date of Patent: March 19, 2013Assignee: FEI CompanyInventors: Raymond Hill, Lawrence Scipioni, Colin August Sanford, Mark DiManna, Michael Tanguay
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Publication number: 20110309263Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: ApplicationFiled: August 31, 2011Publication date: December 22, 2011Applicant: FEI COMPANYInventors: Raymond Hill, Colin August Sanford, Lawrence Scipioni, Mark DiManna, Michael Tanguay
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Patent number: 8013311Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: GrantFiled: October 9, 2009Date of Patent: September 6, 2011Assignee: FEI CompanyInventors: Raymond Hill, Lawrence Scipioni, Colin August Sanford, Mark DiManna, Michael Tanguay
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Publication number: 20100025578Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: ApplicationFiled: October 9, 2009Publication date: February 4, 2010Applicant: FEI COMPANYInventors: Raymond Hill, Colin August Sanford, Lawrence Scipioni, Mark DiManna, Michael Tanguay
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Patent number: 7601976Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: GrantFiled: December 18, 2006Date of Patent: October 13, 2009Assignee: FEI CompanyInventors: Raymond Hill, Colin August Sanford, Lawrence Scipioni, Mark DiManna, Michael Tanguay
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Publication number: 20080035860Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: ApplicationFiled: December 18, 2006Publication date: February 14, 2008Applicant: FEI CompanyInventors: Raymond Hill, Colin Sanford, Lawrence Scipioni, Mark DiManna, Michael Tanguay
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Patent number: 7161159Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: GrantFiled: July 13, 2004Date of Patent: January 9, 2007Assignee: FEI CompanyInventors: Raymond Hill, Colin August Sanford, Lawrence Scipioni, Mark DiManna, Michael Tanguay
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Publication number: 20050035291Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.Type: ApplicationFiled: July 13, 2004Publication date: February 17, 2005Inventors: Raymond Hill, Colin Sanford, Lawrence Scipioni, Mark DiManna, Michael Tanguay