Patents by Inventor Mark Drewes Boerema

Mark Drewes Boerema has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8648997
    Abstract: A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
    Type: Grant
    Filed: December 2, 2009
    Date of Patent: February 11, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Theodoor Wilhelmus Van Der Heijden, Mark Drewes Boerema, Matthias Ruhm, Mario Putz
  • Publication number: 20100141910
    Abstract: A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
    Type: Application
    Filed: December 2, 2009
    Publication date: June 10, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Theodoor Wilhelmus VAN DER HEIJDEN, Mark Drewes Boerema, Matthias Ruhm, Mario Putz