Abstract: Systems and methods are provided for refining a design cycle for an integrated circuit. An integrated circuit design is generated. A plurality of non-critical paths within the integrated circuit design are identified. A set of at least one of the plurality of non-critical paths is modified to produce a modified design in which the sensitivity of each of the set of non-critical paths to at least one parameter is enhanced. Each parameter is either a design parameter or a process parameter. An integrated circuit is fabricated according to the modified design. The fabricated integrated circuit is evaluated to measure a set of timing data representing each of the plurality of non-critical paths. The value of the parameter is determined from the measured set of timing data.

Abstract: The present application is directed to a method of selectively positioning sub-resolution assist features (SRAF) in a photomask pattern for an interconnect. The method comprises determining if a first interconnect pattern option will result in improved circuit performance compared with a second interconnect pattern option, where the first option is designed to be formed with SRAF and the second option is designed to be formed without SRAF. If it is determined that the first option will result in improved circuit performance, the first pattern option is selected as a target pattern and one or more SRAF patterns are positioned to facilitate patterning of the first pattern option. If it is not determined that the first option will result in improved performance, the second pattern option is selected as a target pattern.

Abstract: Systems and methods are provided for refining a design cycle for an integrated circuit. An integrated circuit design is generated. A plurality of non-critical paths within the integrated circuit design are identified. A set of at least one of the plurality of non-critical paths is modified to produce a modified design in which the sensitivity of each of the set of non-critical paths to at least one parameter is enhanced. Each parameter is either a design parameter or a process parameter. An integrated circuit is fabricated according to the modified design. The fabricated integrated circuit is evaluated to measure a set of timing data representing each of the plurality of non-critical paths. The value of the parameter is determined from the measured set of timing data.

Abstract: The present application is directed to a method of selectively positioning sub-resolution assist features (SRAF) in a photomask pattern for an interconnect. The method comprises determining if a first interconnect pattern option will result in improved circuit performance compared with a second interconnect pattern option, where the first option is designed to be formed with SRAF and the second option is designed to be formed without SRAF. If it is determined that the first option will result in improved circuit performance, the first pattern option is selected as a target pattern and one or more SRAF patterns are positioned to facilitate patterning of the first pattern option. If it is not determined that the first option will result in improved performance, the second pattern option is selected as a target pattern.

Abstract: A fabric holder of the type that attaches to a carriage of an embroidery machine and positions an embroidery frame in position relative to an embroidery platform, including a base, and multiple fabric clamping frame sets, each of the clamping frame sets having a lower clamping member and an upper clamping member mounted for movement between a closed position and an open release position. The lower clamping member and the upper clamping member of a selected set are releasably attached to the fabric holder.

Abstract: A system for varying the transmission of an attenuated phase shift mask (14) is provided that includes an attenuated phase shift mask (14), a transparent support (16) and a modulation system (18). The mask (14) comprises a variable transmission material. The transparent support (16) supports the mask (14). The modulation system (18) is operable to apply a variable force at the mask (14) to control the transmission of the mask (14).

Abstract: A fabric frame holder for holding a fabric to be embroidered using automated embroidery equipment having a body portion, multiple sets of adaptor plates, and a multiple fabric mounting frames. The body portion has a central area for releasably receiving the fabric mounting frames, and a pair of attachment arms extending laterally to either side. The attachment arms terminate in attachment ends at which points one set of the adaptor plates, which correspond to the type of embroidery machine being utilized, are attached, and a selected fabric holding frames is mounted to the central body portion.

Abstract: An interchangeable and manually operable embroidery frame for holding an article to be embroidered using automated embroidery equipment having a base plate, and upper clamping member pivotally connected to the base plate, a clamping mechanism for biasing the upper clamping member in closed contact with the base, mounting arms extending outwardly from the base plate, and selectively removable adapters attached to each mounting arm, whereby the adapters enable the clamping frame to be mounted on a selected automated embroidery machine.