Abstract: A system and method for controlling atomic particles using projected light are provided. In some aspects, a method includes providing a plurality of atomic particles, and generating light fields using frequencies shifted from at least one atomic resonance. The method also includes forming a two-dimensional (“2D”) optical array using the generated light fields, wherein the 2D optical array comprises linear segments of light, and projecting the 2D optical array on the plurality of atomic particles to control their respective locations in space.

Abstract: A system and method for controlling atomic particles using projected light are provided. In some aspects, a method includes providing a plurality of atomic particles, and generating light fields using frequencies shifted from at least one atomic resonance. The method also includes forming a two-dimensional (“2D”) optical array using the generated light fields, wherein the 2D optical array comprises linear segments of light, and projecting the 2D optical array on the plurality of atomic particles to control their respective locations in space.

Abstract: A single cavity may be used to produce up-converted, quantum-entangled beams relying on the common field of the pumping energy stimulating to up-converting material to produce the quantum entanglement.

Abstract: A single cavity may be used to produce up-converted, quantum-entangled beams relying on the common field of the pumping energy stimulating to up-converting material to produce the quantum entanglement.

Abstract: Atomic lithography for depositing atoms on a substrate is carried out by forming an atomic beam, and directing it toward a substrate, and providing converging laser beams above a surface of the substrate, wherein the laser beams are modulated by at least one spatial light modulator through which the laser beam passes to form at least one high intensity optical spot by interference to selectively focus the atomic beam. The optical spot and focused atomic beam can be translated in a selected pattern by appropriate control of the individual pixel elements in the spatial light modulator. An atomic lithography system that can be configured to form arbitrary two-dimensional nanostructures on a substrate may include at least one spatial light modulator and lenses positioned adjacent the at least one spatial light modulator. The lenses and the at least one spatial light modulator are configured to selectively form a high intensity optical spot to focus atoms from an atomic beam onto the substrate.

Abstract: In a fiber optic communication system, an acoustooptic modulator operates to provide a coherent light beam that is data encoded in the beam's time domain, for example by intensity modulation of the beam. A spatial light modulator then operates to address encode the beam by modulating the beam in the space domain. The resulting data and address modulated beam possesses the property of orthogonality. This beam is now transmitted to the input of a multimode optical fiber. The speckle pattern that exits the output of the optical fiber also exhibits orthogonality. This output beam is presented to a beam splitter in order to produce two spatially modulated speckle light patterns therefrom. These two beams are then focused onto photorefractive means whereat a hologram is produced. This hologram operates to address decode the beam output of the optical fiber. Detector means now operates to detect the data by receiving the beam as it is diffracted by the hologram. Ring and star interconnect networks are described.