Patents by Inventor Mark Edwin Baier

Mark Edwin Baier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for use of photosensitive polysilanes as photoresist
    Patent number: 5866306
    Abstract: The present invention relates to the use of certain polyalkylphenyl silanes in photoresists to generate positive tone resist images. The polyalkylphenyl silanes have the formula: ##STR1## where R is C2-C12 alkyl and n is about 150 to 7000.
    Type: Grant
    Filed: June 17, 1993
    Date of Patent: February 2, 1999
    Assignee: International Business Machines Corporation
    Inventors: Robert Dennis Miller, Gregory Michael Wallraff, Mark Edwin Baier