Patents by Inventor Mark Engelhard

Mark Engelhard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process and apparatus for removing residues from semiconductor substrates
    Publication number: 20050183740
    Abstract: The present invention generally relates to a system for cleaning substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from semiconductor substrates, including silicon wafers, using a system of reactive reverse micelle(s) or microemulsions in a densified carbon dioxide matrix. Various reactive chemical agents in the reactive micelle system may be used to effect cleaning and removal of etch and metal residues to levels sufficient for commercial wafer production and processing.
    Type: Application
    Filed: February 19, 2004
    Publication date: August 25, 2005
    Inventors: John Fulton, Daniel Gaspar, Clement Yonker, James Young, Alan Lea, Mark Engelhard