Patents by Inventor Mark Eyolfsou

Mark Eyolfsou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light
    Patent number: 6831734
    Abstract: A method and apparatus for detection of a particular material, such as photo-resist material, on a sample surface. A narrow beam of light is projected onto the sample surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a logic circuit which determines the proper disposition of the sample. The logic circuit controls a sample-handling robotic device which sequentially transfers samples to and from a stage for testing and subsequent disposition. The method is particularly useful for detecting photo-resist material on the surface of a semiconductor wafer.
    Type: Grant
    Filed: March 7, 2002
    Date of Patent: December 14, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Mark Eyolfsou, Elton J. Hochhalter, Joe Lee Phillips, David R. Johnson, Peter S. Frank