Patents by Inventor Mark Fessler

Mark Fessler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12724433
    Abstract: A flow control arrangement includes a housing seating inlet and outlet conduits, an isolation valve arranged within the housing and is connected to the inlet conduit, a flow switch, and a bypass switch. The flow switch has a shutoff trigger, is arranged within the housing, and couples the isolation valve to the outlet conduit. The bypass switch is coupled to the isolation valve and has first and second positions. The flow switch is operably coupled to the isolation valve when the bypass switch is in the first position to close the isolation valve when flow rate of fluid traversing the flow switch rises above the shutoff trigger, and is operably decoupled from the isolation valve when the bypass switch is in the second position to flow fluid through the flow switch at flow rates greater than the shutoff trigger. Semiconductor processing systems and related flow control methods are also described.
    Type: Grant
    Filed: July 12, 2023
    Date of Patent: September 1, 2026
    Assignee: ASM IP Holding B.V.
    Inventors: Glenn Holbrook, Mark Fessler
  • Publication number: 20260234800
    Abstract: A gas system includes an enclosure, a process gas metering valve, a shutoff valve, and a flow switch. The process gas metering valve arranged within the enclosure to flow a process gas to a process chamber of a semiconductor processing system. The shutoff valve is connected to the process gas metering valve to fluidly separate the process gas metering valve from a process gas source. The flow switch is operably connected to the shutoff valve to cease flow of the process gas to the process chamber of the semiconductor processing system using the shutoff valve according to flow of a gas traversing the flow switch. Semiconductor processing systems, gas control methods, and gas system kits are also described.
    Type: Application
    Filed: April 13, 2026
    Publication date: August 13, 2026
    Inventors: Mark Fessler, Glenn Holbrook
  • Patent number: 12624452
    Abstract: A gas system includes an enclosure, a process gas metering valve, a shutoff valve, and a flow switch. The process gas metering valve arranged within the enclosure to flow a process gas to a process chamber of a semiconductor processing system. The shutoff valve is connected to the process gas metering valve to fluidly separate the process gas metering valve from a process gas source. The flow switch is operably connected to the shutoff valve to cease flow of the process gas to the process chamber of the semiconductor processing system using the shutoff valve according to flow of a gas traversing the flow switch. Semiconductor processing systems, gas control methods, and gas system kits are also described.
    Type: Grant
    Filed: May 23, 2022
    Date of Patent: May 12, 2026
    Assignee: ASM IP Holding B.V.
    Inventors: Mark Fessler, Glenn Holbrook
  • Publication number: 20260066201
    Abstract: A safety pressure switch is presented. For avoiding pressure switch malfunction, the present disclosure presents a safety pressure switch comprising: a container shaped as a cylinder, the container comprising a fuse room comprising a fuse socket, a switch room, and a separator comprises a hole; a pressure switch disposed in the switch room; a fuse disposed in the fuse socket; and a first electrical line and a second electrical line connected to the pressure switch through the hole, wherein the separator separates the fuse room and the switch room, and wherein the hole connects the fuse room and the switch room, and wherein the fuse is installed in the first electrical line.
    Type: Application
    Filed: August 27, 2025
    Publication date: March 5, 2026
    Inventors: Pilla Anand Raju, Mark Fessler
  • Publication number: 20240018656
    Abstract: A flow control arrangement includes a housing, an isolation valve, and a flow switch. The housing seats an inlet conduit and an outlet conduit. The isolation valve is arranged in the housing and is connected to the inlet conduit. The flow switch is arranged in the housing, is connected to the isolation valve, and fluidly couples the outlet conduit to the isolation valve. The flow switch further has a shutoff trigger and is operatively connected to the isolation valve to close the isolation valve when flow traversing the isolation valve is greater than the shutoff trigger. Semiconductor processing systems and flow control methods are also provided.
    Type: Application
    Filed: July 12, 2023
    Publication date: January 18, 2024
    Inventors: Glenn Holbrook, Mark Fessler
  • Publication number: 20240019880
    Abstract: A flow control arrangement includes a housing seating inlet and outlet conduits, an isolation valve arranged within the housing and is connected to the inlet conduit, a flow switch, and a bypass switch. The flow switch has a shutoff trigger, is arranged within the housing, and couples the isolation valve to the outlet conduit. The bypass switch is coupled to the isolation valve and has first and second positions. The flow switch is operably coupled to the isolation valve when the bypass switch is in the first position to close the isolation valve when flow rate of fluid traversing the flow switch rises above the shutoff trigger, and is operably decoupled from the isolation valve when the bypass switch is in the second position to flow fluid through the flow switch at flow rates greater than the shutoff trigger. Semiconductor processing systems and related flow control methods are also described.
    Type: Application
    Filed: July 12, 2023
    Publication date: January 18, 2024
    Inventors: Glenn Holbrook, Mark Fessler
  • Publication number: 20220380900
    Abstract: A gas system includes an enclosure, a process gas metering valve, a shutoff valve, and a flow switch. The process gas metering valve arranged within the enclosure to flow a process gas to a process chamber of a semiconductor processing system. The shutoff valve is connected to the process gas metering valve to fluidly separate the process gas metering valve from a process gas source. The flow switch is operably connected to the shutoff valve to cease flow of the process gas to the process chamber of the semiconductor processing system using the shutoff valve according to flow of a gas traversing the flow switch. Semiconductor processing systems, gas control methods, and gas system kits are also described.
    Type: Application
    Filed: May 23, 2022
    Publication date: December 1, 2022
    Inventors: Mark Fessler, Glenn Holbrook