Patents by Inventor Mark Feygin

Mark Feygin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Projection exposure apparatus for semiconductor lithography
    Patent number: 11281114
    Abstract: A projection exposure apparatus for semiconductor lithography having a projection optical unit. The projection optical unit includes a sensor frame, a carrying frame, and a module. The module includes an optical element and actuators for positioning and orienting the optical element. The module is on the carrying frame, and the sensor frame is a reference for the positioning of the optical element. The module includes an infrastructure which includes interfaces for separating a module from the projection optical unit. A method exchanges the module of a projection optical unit of a projection exposure apparatus for semiconductor lithography, wherein the module includes an optical element, while the reference remains in the projection exposure apparatus.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: March 22, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jens Kugler, Mark Feygin, Stefan Xalter, Bernhard Gellrich, Stefan Hembacher
  • PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
    Publication number: 20210080841
    Abstract: A projection exposure apparatus for semiconductor lithography having a projection optical unit. The projection optical unit includes a sensor frame, a carrying frame, and a module. The module includes an optical element and actuators for positioning and orienting the optical element. The module is on the carrying frame, and the sensor frame is a reference for the positioning of the optical element. The module includes an infrastructure which includes interfaces for separating a module from the projection optical unit. A method exchanges the module of a projection optical unit of a projection exposure apparatus for semiconductor lithography, wherein the module includes an optical element, while the reference remains in the projection exposure apparatus.
    Type: Application
    Filed: September 17, 2020
    Publication date: March 18, 2021
    Inventors: Jens Kugler, Mark Feygin, Stefan Xalter, Bernhard Gellrich, Stefan Hembacher