Abstract: Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating using a first and second electrode, the second electrode being positioned apart from the first electrode thereby creating a volume space between the first and second electrodes which volume space is covered by a duct sealed to the electrodes. Gas is flowed from the volume space between the first and second electrodes at the same or at a greater rate than the sum of the gaseous coating precursor mixtures of the first and second electrodes. In addition, an improved electrode assembly for use in an atmospheric pressure plasma enhanced chemical vapor deposition coating system that includes a means for distributing a gaseous coating precursor mixture to emerge from an electrode assembly. The improvement relates to a gas distributing subassembly of the electrode assembly.