Patents by Inventor Mark H. McLeod

Mark H. McLeod has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8921221
    Abstract: A photoresist layer is applied over a solder resist layer on a substrate such as a wafer. Openings in the solder resist and photoresist layers are filled with flux-free molten solder using IMS. The process is applicable to fine pitch applications and chip size packaging substrates. A protection layer may be employed to facilitate removal of the photoresist layer from the substrate. An oversized substrate including an adhesive layer on a peripheral area may be employed for providing greater adhesion of a dry film layer to the peripheral area of the substrate than the central portion thereof. The peripheral area is removed following IMS.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: December 30, 2014
    Assignee: International Business Machines Corporation
    Inventors: Mark H. McLeod, Jae-Woong Nah
  • Patent number: 8875978
    Abstract: A process and tools for forming spherical metal balls is described incorporating molds, injection molded solder, a liquid or gaseous environment to reduce or remove metal oxides and an unconstrained reflow of metal in a heated liquid or gas and solidification of molten metal in a cooler liquid or gas.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: November 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Claudius Feger, Peter A. Gruber, Mark H. McLeod, Jae-Woong Nah
  • Patent number: 8820612
    Abstract: Solder bumps of uniform height are provided on a substrate through the use of injection molded solder. Copper pillars or ball limiting metallurgy are formed over I/O pads within the channels of a patterned layer of photoresist. Solder is injected over the pillars or BLM, filling the channels. The solder, which does not contain flux, is allowed to solidify. It forms a plurality of solder structures (bumps) of equal heights. Solder injection and solidification are preferably carried out in a nitrogen environment or a forming gas environment. Molten solder can be injected in channels formed in round wafers without spillage using a carrier assembly that accommodates such wafers and a fill head.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: September 2, 2014
    Assignee: International Business Machines Corporation
    Inventors: Claudius Feger, Mark H. McLeod, Jae-Woong Nah, Eric D. Perfecto
  • Patent number: 8496159
    Abstract: Solder bumps of uniform height are provided on a substrate through the use of injection molded solder. Copper pillars or ball limiting metallurgy are formed over I/O pads within the channels of a patterned layer of photoresist. Solder is injected over the pillars or BLM, filling the channels. The solder, which does not contain flux, is allowed to solidify. It forms a plurality of solder structures (bumps) of equal heights. Solder injection and solidification are preferably carried out in a nitrogen environment or a forming gas environment. Molten solder can be injected in channels formed in round wafers without spillage using a carrier assembly that accommodates such wafers and a fill head.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: July 30, 2013
    Assignee: International Business Machines Corporation
    Inventors: Claudius Feger, Mark H. McLeod, Jae-Woong Nah, Eric D. Perfecto
  • Publication number: 20120318855
    Abstract: A photoresist layer is applied over a solder resist layer on a substrate such as a wafer. Openings in the solder resist and photoresist layers are filled with flux-free molten solder using IMS. The process is applicable to fine pitch applications and chip size packaging substrates. A protection layer may be employed to facilitate removal of the photoresist layer from the substrate. An oversized substrate including an adhesive layer on a peripheral area may be employed for providing greater adhesion of a dry film layer to the peripheral area of the substrate than the central portion thereof. The peripheral area is removed following IMS.
    Type: Application
    Filed: June 20, 2011
    Publication date: December 20, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Mark H. McLeod, Jae-Woong Nah
  • Publication number: 20120305633
    Abstract: Solder bumps of uniform height are provided on a substrate through the use of injection molded solder. Copper pillars or ball limiting metallurgy are formed over I/O pads within the channels of a patterned layer of photoresist. Solder is injected over the pillars or BLM, filling the channels. The solder, which does not contain flux, is allowed to solidify. It forms a plurality of solder structures (bumps) of equal heights. Solder injection and solidification are preferably carried out in a nitrogen environment or a forming gas environment. Molten solder can be injected in channels formed in round wafers without spillage using a carrier assembly that accommodates such wafers and a fill head.
    Type: Application
    Filed: June 6, 2011
    Publication date: December 6, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Claudius Feger, Mark H. McLeod, Jae-Woong Nah, Eric D. Perfecto
  • Publication number: 20120305631
    Abstract: Solder bumps of uniform height are provided on a substrate through the use of injection molded solder. Copper pillars or ball limiting metallurgy are formed over I/O pads within the channels of a patterned layer of photoresist. Solder is injected over the pillars or BLM, filling the channels. The solder, which does not contain flux, is allowed to solidify. It forms a plurality of solder structures (bumps) of equal heights. Solder injection and solidification are preferably carried out in a nitrogen environment or a forming gas environment. Molten solder can be injected in channels formed in round wafers without spillage using a carrier assembly that accommodates such wafers and a fill head.
    Type: Application
    Filed: June 18, 2012
    Publication date: December 6, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Claudius Feger, Mark H. McLeod, Jae-Woong Nah, Eric D. Perfecto
  • Patent number: 5243140
    Abstract: A direct distribution wiring system is provided which facilitates the effecting of repair or engineering change in a Multi-chip module (MCM) while eliminating the need for redistribution and/or buried connections between IC attachment pads and engineering change pads, thus eliminating the need for patterned conductor layers corresponding to such functions. The operation of the MCM is improved by the wiring system allowing the reduction of lumped capacitances by disconnection of defective conductors, accomplished by providing severable connectors in a direct distribution structure, as well as the elimination of redistribution wiring layers and increased IC density on the MCM. Full potential fault coverage as well as full discretion in reversible engineering changes is provided by forming all elements of the wiring system on the surface of the device.
    Type: Grant
    Filed: October 4, 1991
    Date of Patent: September 7, 1993
    Assignee: International Business Machines Corporation
    Inventors: Harsaran S. Bhatia, Mario J. Interrante, Suresh D. Kadakia, Shashi D. Malaviya, Mark H. McLeod, Sudipta K. Ray, Herbert I. Stoller
  • Patent number: 5159531
    Abstract: In an electronic package, improved disk shaped thermal bridge elements provide multiple conductive paths between devices to be cooled and a cold plate. The thermal bridge elements are disks progressively stacked and having bulge shapes and radial finger contacts for providing multiple compliant heat conduction paths between each device and a cold plate.
    Type: Grant
    Filed: February 28, 1992
    Date of Patent: October 27, 1992
    Assignee: International Business Machines Corporation
    Inventors: Joseph L. Horvath, Mark H. McLeod, Carl Yakubowski
  • Patent number: 4489272
    Abstract: A test circuit that is particularly suitable for inclusion on an LSI chip when testing a new technology or process. The circuit will enable accurate determination of the effects of loading on the turn-on and turn-off delays of one or more logic circuits on the chip. These determinations are based upon a comparison of the periods of different signals obtainable from the test circuit.
    Type: Grant
    Filed: July 6, 1982
    Date of Patent: December 18, 1984
    Assignee: International Business Machines Corporation
    Inventor: Mark H. McLeod
  • Patent number: 4392105
    Abstract: A test circuit that is particularly suitable for inclusion on an LSI chip when testing a new technology. The circuit will enable accurate determination of the turn-on and turn-off delays of a logic circuit on the chip. Two related feedback loops are provided, one of the loops containing the circuit being tested. The differences in time duration between related portions of the two loops correspond to the turn-on and turn-off delays of the circuit being tested.
    Type: Grant
    Filed: December 17, 1980
    Date of Patent: July 5, 1983
    Assignee: International Business Machines Corp.
    Inventor: Mark H. McLeod